This handbook is a broad review of semiconductor materials and process technology, with emphasis on very large-scale integration (VLSI) and ultra large scale integration (ULSI). The technology of integrated circuit (IC) processing is expanding so rapidly that it can be difficult for the scientist working in one area to keep abreast of developments in other areas of the field. This handbook solves this problem by bringing together -snapshots- of the various aspects of the technology.

This is a comprehensive overview of the technology of plasma-based processing, written by an outstanding group of 29 contributors.

This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry.

The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution,...

This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process technology, developments, and applications are described.

This is a comprehensive overview of the major areas of ceramic thin films and coatings, by 21 authorities on the subject. The book is directed toward potential users of the technology and will also provide a broad update for experts in the field.

The book presents a series of reviews of many of the most active and technically important areas of ceramic films and coatings. This thorough review of the state of the art of ceramic films and coatings should be a welcome addition to the ceramic engineer's or scientist's library.

Electrodeposition allows the -tailoring- of surface properties of a bulk material or, in the case of electroforming, the entire part. Deposits can be produced to meet a variety of designer demands. For this reason and for the possibilities that exist in terms of -new materials- for a variety of applications, a thorough understanding of the materials science of electrodeposition is of utmost importance. This book provides that understanding.

This excellent, in-depth review of diamond films and coatings covers their properties, growth, deposition, characterization, and applications. The eight chapters are written by experts in their field. Early studies on synthetic diamonds were done in the 1950s and 1960s, however, their use and importance were not recognized until the late 1970s and early 1980s. These coatings are now being used in high temperature and tribological applications, optics and electro-optics applications, and certainly biological applications.

This is the first readily available and practical book on ceramic cutting tools to appear in 28 years. The new classes of ceramic tool materials are covered, and how they perform from a materials engineering standpoint. New ground is also broken in the introduction of the latest material to be developed, chemically vapor deposited diamond tools. These new tools perform exceptionally well in the machining of aluminum, composites, and other non-ferrous metallic and non-metallic materials. This book also provides: An understanding of how different ceramic tools perform in machining operations...

Molecular beam epitaxy has been extended to an ever-widening variety of materials while maintaining key advantages over other techniques of epitaxial film growth such as chemical vapor deposition (CVD), liquid phase epitaxy (LPE), metal-organic vapor phase epitaxy (MOVPE) and related techniques. In this volume the Editor and Contributors have set out to describe the use of MBE for a range of key materials systems which are of interest for both technological and fundamental reasons. Prior books on MBE have provided an introduction to the basic concepts and techniques of MBE and emphasize...

This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications.

This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and...