Chemical Vapor Deposition of Tungsten and Tungsten Silicides for Vlsi/ ULSI Applications

ISBN-13: 9780815512882 / Angielski / Twarda / 1992 / 251 str.

John E. Schmitz

Opis

This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process technology, developments, and applications are described.

Recenzje

"After reading this book, an engineer should have all the necessary background." --European Semiconductor

Spis treści

Introduction
The Blanket Tungsten Approach
The Selective Tungsten Approach
Blanket Versus Selective Tungsten
Tungsten as Interconnect Material
The Chemistry of CVD-W and Properties of Tungsten
The Deposition Equipment
Miscellaneous
Chemical Vapor Deposition of Tungsten Silicide
References
Author Index
Subject Index
Appendix: Unit Cells of W and WSi2