Handbook of Plasma Processing Technology: Fundamental, Etching, Deposition and Surface Interactions

ISBN-13: 9780815512202 / Angielski / Twarda / 1990 / 546 str.

Jerome J. Cuomo; Stephen M. Rossnagel; William D. Westwood

Opis

This is a comprehensive overview of the technology of plasma-based processing, written by an outstanding group of 29 contributors.

Recenzje

"The text provides and excellent reference for plasma processing." --SAMPE Journal

Spis treści

Techniques for IC ProcessingIntroduction to Plasma Concepts and Discharge ConfigurationsFundamentals of Sputtering and ReflectionBombardment-Induced Compositional Changes with Alloys, Oxides, Oxysalts, and HalidesRF Diode Sputter Etching and DepositionMagnetron Plasma Deposition ProcessesBroad-Beam Ion SourceReactive Ion EtchingReactive Sputter DepositionPlasma Enhanced Chemical Vapor Deposition of Thin Films for MicroelectronicsElectron Cyclotron Resonance Microwave Discharges for Etching and Thin Film DepositionHollow Cathode Etching and DepositionIon PlatingIonized Cluster Beam (ICB) Deposition TechniquesThe Activated Reactive Evaporation (ARE) ProcessFormation of Thim Films by Remote Plasma Enhanced Chemical Vapor Deposition (Remote PECVD)Selective Bias Sputter DepositionVacuum Arc-Based ProcessingIon Source Interactions: General UnderstandingsIon Assisted DepositionMicrostructural Control of Plasma-Sputtered Refractory Coatings