Kategoria BISAC: Technology & Engineering >> Electronics - Microelectronics

Plasma etching has long enabled the perpetuation of Moore's Law. Today, etch compensation helps to create devices that are smaller than 20 nm. But, with the constant downscaling in device dimensions and the emergence of complex 3D structures (like FinFet, Nanowire and stacked nanowire at longer term) and sub 20 nm devices, plasma etching requirements have become more and more stringent. Now more than ever, plasma etch technology is used to push the limits of semiconductor device fabrication into the nanoelectronics age. This will require improvement in plasma technology (plasma sources,...

Beyond enabling new capabilities, plasma-based techniques, characterized by quantum radicals of feed gases, hold the potential to enhance and improve many processes and applications. Following in the tradition of its popular predecessor, Plasma Electronics, Second Edition: Applications in Microelectronic Device Fabrication explains the fundamental physics and numerical methods required to bring these technologies from the laboratory to the factory.
Emphasizing computational algorithms and techniques, this updated edition of a popular monograph supplies a complete and up-to-date...

Silicon, as a single-crystal semiconductor, has sparked a revolution in the field of electronics and touched nearly every field of science and technology. Though available abundantly as silica and in various other forms in nature, silicon is difficult to separate from its chemical compounds because of its reactivity. As a solid, silicon is chemically inert and stable, but growing it as a single crystal creates many technological challenges.

Crystal Growth and Evaluation of Silicon for VLSI and ULSI is one of the first books to cover the systematic growth of silicon single...

This book illustrates interfacial properties, preparation, characterization, devices, and applications from the standpoint of nano-interfacial tailoring. Since the primary focus of the book is on the use of nanocomposite dielectrics in electrical applications, chapters are devoted to directly relevant topics, such as surface and bulk breakdown processes. However, the mechanisms that underpin such behavior are not unique. Therefore, the book also addresses related topics that range from the chemistry of polymer and nanocomposite degradation to the simulation of charge transport dynamics in...

The considerable growth of RFID is currently accompanied by the development of numerous identification technologies that complement those already available while seeking to answer new problems. Chipless RFID is one example. The goal is to both significantly reduce the price of the tag and increase the amount of information it contains, in order to compete with the barcode while retaining the benefits of a flexible reading approach based on radio communication. To solve the problem of the number of bits, this book describes the possibility of coding the information at the level of the...

Semiconductors for Photocatalysis, Volume 97 covers the latest breakthrough research and exciting developments in semiconductor photocatalysts and electrodes for water splitting and CO₂ reduction. It includes a broad range of materials such as metal-oxides, metal-nitrides, silicon, III-V semiconductors, and the emerging layered compounds. New to this volume are chapters covering the Fundamentals of Semiconductor Photoelectrodes, Charge Carrier Dynamics in Metal Oxide Photoelectrodes for Water Oxidation, Photophysics and Photochemistry at the Semiconductor/Electrolyte...

Advances in Imaging and Electron Physics, Volume 201, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, and digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains.

• Contains contributions from leading authorities on microscopy...

Advances in Imaging and Electron Physics, Volume 202, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy.

The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains.

• Contains contributions from leading authorities on the...

Advances in Imaging and Electron Physics, Volume 203, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. It features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.

• Contains contributions from leading authorities on the subject...

Advances in Imaging and Electron Physics, Volume 204, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.

• Contains contributions from leading authorities on the...