Plasma based transfer of photoresist (PR) patterns using 193nm PR films usually suffer from high removal rates and excessive surface and line edge roughness. The effects of process time, PR material, bias and source power, pressure and gas chemistry were studied. Polymer destruction in the top surface, oxygen and hydrogen loss along with fluorination were observed for all materials initially, which was followed by steady state etch conditions. A strong dependence of plasma-induced surface chemical and morphological changes on polymer structure was observed. In particular, the adamantane...
Plasma based transfer of photoresist (PR) patterns using 193nm PR films usually suffer from high removal rates and excessive surface and line edge ro...
This book examines the European discussion about alternative schooling in the 20th century. It refers to a stream of concepts that are often described as New Education, Progressive Education, Education Nouvelle or Reformpadagogik, and discusses a range of different models of alternative schooling.
This book examines the European discussion about alternative schooling in the 20th century. It refers to a stream of concepts that are often described...
