Surveys the role of plasma physics and chemistry in various fields of technology, such as lamps, the treatment of materials, plasma sources for microwave excitation, and the plasma destruction of pollutants. Among the topics are basic concepts, nonequilibrium modelling, diagnostics, and laser intera

The present book contains the proceedings of the workshop "Plasma Technology and Applications" which was held at 11 Ciocco (Lucca-Italy) during 5-6 July 1991. The workshop was organized just before ICPIG XX to emphasize the role of plasma physics and plasma chemistry in different fields of technology. Topics cover different applications such as lamps, plasma treatment of materials (etching, deposition, nitriding), plasma sources (microwave excitation, negative ion sources) and plasma destruction of pollutants. Several chapters deal with basic concepts in plasma physics, non- equilibrium...