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Self-organized, nano-scale structures appear on solid surfaces under ion beam irradiation with ion energies in the keV range. Within the last decade, surface engineering by ion beam sputtering (IBS) has become a very promising candidate for bottom-up production techniques of nano-devices. Morphologies like ripples, and regular arrays of dots, pyramids and pits as well as ultra-smooth surfaces have been obtained on a wide variety of substrates, including important semiconductor materials like Si, Ge, GaAs and InP. In spite of many substantial improvements of experimental surface...