Handbook of Emerging Materials for Semiconductor Industry

ISBN-13: 9789819966486 / Angielski

Young Suh Song; Laxman Raju Thoutam; Shubam Tayal

Spis treści

 

Part I. Foundation of Emerging Materials

 

Chapter 1

Introduction to Recent Emerging Materials

Chapter 2

Discovery of Emerging Nanomaterials

Chapter 3

Carbon-based Nanomaterials: Graphite, Graphene, Carbon Nanotube (CNT)

Chapter 4

Metamaterials

Chapter 5

Perovskite Materials

Chapter 6

Insulators and High-k Materials

Chapter 7

Silicon and IV-Group Molecules

Chapter 8

Thermal Function of Nanomaterials

Chapter 9

Mechanical Function of Nanomaterials

Chapter 10

Electrical/Electronic Function of Nanomaterials

Chapter 11

Optical Function of Nanomaterials

Chapter 12

The Other Functions of Nanomaterials

 

Part II. Fabrication and Design

 

Chapter 13

Introduction to Latest Fabrication Techniques

Chapter 14

Oxidation

Chapter 15

Molecular Layer Growth – CVD, ALD, Epitaxy

Chapter 16

Lithography – E-beam, EUV, NIL

Chapter 17

Ion-Implantation

Chapter 18

Metal Deposition

Chapter 19

AI-driven Design Techniques for Emerging Materials

Chapter 20

Multi-wafer Process

Chapter 21

Fabrication of CMOS – Planar MOSFET

Chapter 22

Fabrication of CMOS – Multi-gate MOSFET

Chapter 23

Fabrication of Memory Cell

Chapter 24

Fabrication of Flash Technology

 

Part III. Measurement and Test

 

Chapter 25

Basic Measurement Terminology: Precision, Accuracy, Errors, Standard Deviation

Chapter 26

Reliability Terminology – Range, Resolution, Noise, Bandwidth

Chapter 27

Quality Assurance for Material Design

Chapter 28

Reliability Testing for Emerging Materials

Chapter 29

Opportunities and Challenges for Reliable Material Design

Chapter 30

Contact Resistance and Schottky Barrier

Chapter 31

Oxide Layer and Traps

Chapter 32

Carrier Lifetime and Generation/Recombination Process

Chapter 33

Practice I. Probe Station

Chapter 34

Practice II. Bipolar Variable Measurement

Chapter 35

Practice III. MOS Variable Measurement

 

Part IV. Semiconductor Industry Application

Chapter 36

Introduction to Semiconductor Industry: IC Chip, Circuit, and Transistor

Chapter 37

Energy Efficiency Limits of Conventional CMOS Transistor

Chapter 38

Limitation of Scaling: Power Consumption and Subthreshold Swing

Chapter 39

Beyond Transistor Scaling: Futuristic Device Structure for the Tera-scale Regime

Chapter 40

Negative-capacitance Field Effect Transistor

Chapter 41

Accomplishing Low Power Consumption with Tunneling Transistor

Chapter 42

Advanced Tunnel Field-effect Transistor

Chapter 43

Modelling of Gate Engineered Tunnel Field-effect Transistor

Chapter 44

Heterojunction Tunnel Field-effect Transistors and Applications

Chapter 45

Graphene and 2D Semiconductors

Chapter 46

Spin-based Devices: Nano-magnetic Logic and Magnetic Computing

Chapter 47

Design for High Reliability Transistors by Incorporating New Materials

Chapter 48

Design of Biosensor with High Sensing Margin

Chapter 49

Design for Artificial Intelligence – Neuron, Synapse, and Neuromorphic Application

Chapter 50

Design for Artificial Intelligence System – Neuromorphic Chip Design (CPU, GPU)

Chapter 51

Parallel Computation for Artificial Intelligence: Future of Semiconductor Industry

Chapter 52

Practice I. 3D TCAD Simulation for CMOS Devices with Emerging Materials

Chapter 53

Practice II. 3D TCAD Simulation for Memory Devices with Emerging Materials

Chapter 54

Practice III. 3D TCAD Simulation for SRAM Circuit with Emerging Materials

O autorze

Dr. Young Suh Song is a(n):​

• IEEE Technical Committee (USA), IEEE ICCSS (2022 - Present)
•  Assistant Professor, Department of Computer Science, Korea Military Academy (2021 – Present)
• Full Time Lecturer, Department of Computer Science, Korea Military Academy (2020 – 2021)
• Research Interests - Emerging Materials, Nanomaterials, Nanotechnology, Semiconductor
• Best Paper Award - IEEE  International Conference on Circuits, Systems and Simulation, 2022.
• Best Paper Award - Journal of the Institute of Electronics and Information Engineers
•  Editorial Work – Wiley (USA), CRC Press (USA)
•  Chapter Contributor – Springer, CRC Press (USA)
• Journal Reviewer – IEEE Transactions on Electron Devices (USA),
• ECS Journal of Solid State Science and Technology (UK)

Dr. Laxman Raju Thoutam received his Ph.D. from Northern Illinois University, DeKalb, USA. He is currently Assistant Professor at SR University, Warangal, India. His research interests are in the areas of nanoscience, materials science and device physics.

Dr. Shubham Tayal receive his Ph.D. from NIT Kurukshetra, India. He is currently Assistant Professor at SR University, Warangal, India. His research interests are in the areas of VLSI design and microelectronics.

Dr. J. Ajayan received his Ph.D.  in electronics and communication engineering from Karunya University, Coimbatore, India, in 2017. He is Associate Professor in the Department of Electronics and Communication Engineering at SR University, Warangal, India. His research interests are in the areas of CMOS VLSI design, solid-state devices, microelectronics and nanotechnology.

Prof. T. S. Arun Samuel is a Full Professor of Dept. of Electronics and Communication Engineering, National Engineering College, K.R. Nagar.