wyszukanych pozycji: 2
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Advanced Ta-Based Diffusion Barriers for Cu Interconnects
ISBN: 9781604564518 / Angielski / Miękka / 2009 / 102 str. Termin realizacji zamówienia: ok. 30 dni roboczych. Copper has become the standard metallisation material for on-chip interconnects in high-performance microprocessors. This book intends to carry out microstructure and functional property investigations for advanced, high-performance Tabased diffusion barri
Copper has become the standard metallisation material for on-chip interconnects in high-performance microprocessors. This book intends to carry out mi...
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cena:
215,41 |
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Des Müßiggängers Manifest: und andere egoistische Schriften
ISBN: 9798275600155 / Niemiecki / Miękka / 2026 / 132 str. Termin realizacji zamówienia: ok. 16-18 dni roboczych. |
cena:
28,67 |