Polysulfones as X-Ray Resists

ISBN-13: 9783639166484 / Angielski / Miękka / 2009 / 60 str.

Calderon Wilkinson

Opis

The microlithographic process, essential in the fabrication of microdevices, uses high-energy radiation to transfer a pattern onto a thin film of polymer resist. Pattern transfer occurs by modifying the properties (solubility or volatility) of the polymer film exposed to radiation. Poly(olefin sulfones) exhibit a high sensitivity to x-rays, which is a desirable property for polymer resists used in the microlithographic process. The potential utility of these new resins prompted a study of the mechanism of degradation promoted by x-ray radiation. In this study, the effect of x-ray radiation on polysulfones with varied chemical structures was analyzed using x-ray absorption near-edge structure (XANES) spectroscopy and in-situ mass spectroscopy (MS). Interesting differences in the mode of degradation of certain poly(olefin sulfones) was observed. The results provide important groundwork for further studies of polysulfones as x-ray resists.

O autorze

Gina graduated from Louisiana State University with a B.S. in
Microbiology in 1995 and a M.S. in Chemistry in 2002. She has
worked in the fields of x-ray microlithography, protein
crystallography and molecular pharmacology. She is now a Mission
Support Scientist at NASA Johnson Space Center since 2007.