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Kategorie szczegółowe BISAC

Photosensitive Polyimides: Fundamentals and Applications

ISBN-13: 9781566762977 / Angielski / Twarda / 1995 / 328 str.

Kazuyuki Horie; Takashi Yamashita; Yamashita Yamashita
Photosensitive Polyimides: Fundamentals and Applications Yamashita, Takashi 9781566762977 CRC - książkaWidoczna okładka, to zdjęcie poglądowe, a rzeczywista szata graficzna może różnić się od prezentowanej.

Photosensitive Polyimides: Fundamentals and Applications

ISBN-13: 9781566762977 / Angielski / Twarda / 1995 / 328 str.

Kazuyuki Horie; Takashi Yamashita; Yamashita Yamashita
cena 2081,53
(netto: 1982,41 VAT:  5%)

Najniższa cena z 30 dni: 1889,01
Termin realizacji zamówienia:
ok. 22 dni roboczych.

Darmowa dostawa!

This is the first book to provide an in-depth presentation of photosensitive polyimides for electronic and photonic applications. The authors are leading specialists in this field from Japan, Europe and the U.S.
From the Preface
Aromatic polyimides were developed originally as thermostable flexible polymer films for space applications. Now polyimides have found widespread use in the manufacture of electronic devices and have been employed in increasingly diverse areas of electronics and information technology. In addition to their excellent thermal stability and high processability, a wide range of chemical and physical properties provided by molecular engineering makes polyimides highly versatile in the electronics and information industries.
Lithography of polyimides is an inevitable process in using polyimides for microelectronic fields, and hence increasing research has been devoted to developing photosensitive polyimides, which make it unnecessary to use photoresists for patterning polyimides and diminishing markedly the number of steps in fabrication of various electronic devices.
In addition, the development of technology of photosensitive polyimides is expected to play a great role in manufacturing photonic devices in the near future, when the design and control of hyper fine structures . . . including higher thermal stability and better processability would be essential.

Kategorie:
Nauka, Chemia
Kategorie BISAC:
Technology & Engineering > Materials Science - General
Science > Chemia
Technology & Engineering > Textiles & Polymers
Wydawca:
CRC
Język:
Angielski
ISBN-13:
9781566762977
Rok wydania:
1995
Ilość stron:
328
Waga:
0.70 kg
Wymiary:
24.03 x 15.19 x 2.87
Oprawa:
Twarda
Wolumenów:
01

PrefaceIntroduction to Photopolymers and Microelectronics Introduction Photosensitive Polymers Polymers for Microelectronics ReferencesApplications of Polyimides in ElectronicsIntroduction Commercially Available Photosensitive Polyimides Performance of Commercial Photosensitive Polyimides Applications Outlook ReferencesThermal and Mechanical Properties of Polyimides and Control of High-Order StructuresIntroduction Thermal and Mechanical Properties of Aromatic Polyimides Control of High-Order Structures of Aromatic Polyimides ReferencesElectronic Configuration of Polyimides and Their Photophysical ProcessesIntroduction Color of Polyimide Films Emission of Polyimide Films Photophysical Processes in Polyimide Model Compounds Photochemistry of Polyimide Model Compounds Other Related Emission Behavior of Imide Compounds and Their Analogue Photoconductivity of Polyimide Films ReferencesDesign of Photosensitive Polyimide Precursor SystemsIntroduction Structure and Reaction of Photosensitive Polyimide Precursors Properties of Polyimides Formed from Photosensitive Polyimide Precursors Conclusion ReferencesIntrinsically Photosensitive PolyimidesIntroduction Structure and Reaction of Intrinsically Photosensitive Polyimides Photoreactivity Mechanism and Molecular Design for Improvement of Photosensitive Polyimides References Photosensitive Polyimides Based on Chemical Amplification MechanismIntroduction Amplification Process for Photosensitive Materials Chemical Amplification Synthesis of Polyimides Characteristics of Protected Polyimides 6F-t-BOC and 6F-THP Lithographic Performance of Protected Polyimides Acidolytic Deprotection Rate in Film Matrices Photochemical Reaction of PAG in Solid Films Properties of 6F-t-BOC and 6F-THP ReferencesElectron Beam Lithography of PolyimidesIntroduction Characteristics of Radiation Effects of Polyimides Molecular Design of Electron-Beam Sensitive Polyimides Mechanism of Electron-Beam Irradiation of Polyimides ReferencesProcessing of Polyimides and Related TopicsIntroduction Representative Electronic Applications Deposition Methods Patterning of Conventional Polyimides Processing of Photosensitive Polyimides Processes for High-Density Multilevel Metallization ReferencesApplications of Polyimides to Photonic DevicesIntroduction Nonlinear Optical Phenomena Organic versus Inorganic Nonlinear Optical Materials EO Effect in Polymers and Use for Devices Requirements for Polymers in Photonics Polyimide-Based EO Devices NLO Chromophore Requirements for Use in EO Polymer Devices Photosensitive Polyimides in Photonics Higher Levels of Integration: Advantages of Polymers Summary References 39 Tables, 208 Figures Numerous tables and graphs provide extensive quantitative data on polyimides for electronic applications. The many schematics and micrographs illustrate materials, processes and devices. Here is a small sampling.Tables: Patterning and thermal properties of commercially available photosensitive polyimides Mechanical and electrical properties of commercially available photosensitive polyimides Chemical structures of commercially available polyimide films Required properties of photosensitive poyimides Applications of polyimide for electronic devices Materials requirements for EO polymer devicesMicrographs: Memory devices on a silicon wafer, the cell arrays are protected by thick polyimide patterns Layout of a liquid crystal display with polyimide alignment layers SEM picture of line and space pattern formed with 6F-THPSchematics: Chemical principle and processing steps for direct production of PI-patternsPolyimide patterning processes High temperature post-exposure process using photosensitive polyimide precursors Comparison of polyimide patterning processes between polyimides with and without photosensitivity Process flow for planarization with lift-off technique Examples of applications for polymers in photonic systems

Yamashita, Takashi



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