Low Temperature Plasma Technology: Methods and Applications

ISBN-13: 9780367576363 / Angielski / Miękka / 2020 / 494 str.

Paul K. Chu; Xinpei Lu

Opis

This book provides a balanced and thorough treatment of the core principles, novel technology and diagnostics, and state-of-the-art applications of low temperature plasmas. It explores related phenomena, such as plasma bullets, discharge-mode transition of atmospheric pressure plasmas, and self-organization of microdischarges, and describes rele

Recenzje

"This book provides an excellent review of the fundamentals of low temperature plasmas so that those new to this field can get a good understanding as well as learn about recent applications. Students or active professionals working in the area of plasma processing will appreciate the technical breadth, the well-written descriptions, and the abundance of data, graphs, and illustrations that make this book well worth owning."
—IEEE Electrical Insulation Magazine, November/December 2014

Spis treści

Fundamentals: Introduction. Atmospheric Pressure Plasmas. Processing and Characterization: Modeling of Low-Pressure Plasmas. Modeling of Atmospheric Pressure Plasmas. High-Pressure Microcavity Discharges. Atmospheric Pressure Nanosecond Pulsed Discharge Plasmas. On Atmospheric Pressure Nonequilibrium Plasma Jets. Cavity Ringdown Spectroscopy of Plasma Species. Laser-Induced Fluorescence Methods for Transient Species Detection in High-Pressure Discharges. Applications: Plasma Technology in Silicon Photovoltaics. Environmental Applications of Plasmas. Assessment of Potential Applications of Plasma with Liquid Water. Plasma-Assisted Surface Modification of Polymeric Biomaterials. Emerging Applications of Plasmas in Medicine: Fashion versus Efficacy. Plasma Surface Engineering of Titanium-Based Materials for Osteointegration. Index.

O autorze

Paul K. Chu is Chair Professor of Materials Engineering in the Department of Physics and Materials Science at the City University of Hong Kong. A fellow of the IEEE, APS, AVS, and HKIE, Dr. Chu is the author of more than 20 book chapters, 900 journal papers, and 800 conference papers and holds numerous patents. He is also the senior editor of IEEE Transactions on Plasma Science, associate editor of Materials Science & Engineering Reports, and an editorial board member of several international journals. His research activities encompass plasma surface engineering and various types of materials and nanotechnology. He received a PhD in chemistry from Cornell University.

XinPei Lu is a professor (ChangJiang Scholar) in the College of Electrical and Electronic Engineering at Huazhong University of Science and Technology. A senior member of IEEE, Dr. Lu is the author or coauthor of 50 peer-reviewed journal articles and holds six patents. His research interests include low-temperature plasma sources and their biomedical applications, modeling of low-temperature plasmas, and plasma diagnostics. He received a PhD in electrical engineering from Huazhong University of Science and Technology.