Handbook of Thin Film Deposition Processes and Techniques

ISBN-13: 9780815514428 / Angielski / Twarda / 2002 / 72 str.

Krishna Seshan

Opis

The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition.
This second edition explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of submicron dimensions. The book covers PVD, laser and E-beam assisted deposition, MBE, and ion beam methods to bring together all of the physical vapor deposition techniques. The book also includes coverage of chemical mechanical polishing that helps attain the flatness that is required by modern lithography methods and new materials used for interconnect dielectric materials, specifically organic polyimide materials.

Spis treści

Foreword: Gordon MooreRecent Changes in the Semiconductor IndustryDeposition Technologies and Applications: Introduction and OverviewSilicon Epitaxy by Chemical Vapor DepositionChemical Vapor Deposition of Silicon Dioxide FilmsMetal Organic Chemical Vapor DepositionFeature Scale ModelingThe Role of Metrology and Inspection to Semiconductor ProcessingContamination Control, Defect Detection and Yield Enhancement in Gigabit ManufacturingSputtering and Sputter DepositionLaser and Electron Beam Assisted ProcessingMolecular Beam Epitaxy: Equipment and PracticeIon Beam DepositionChemical Mechanical PolishingOrganic Dielectrics in Multilevel Metallization of Integrated CircuitsPerformance, Processing, and Lithography TrendsIndex

O autorze

Krishna Seshan