Handbook of Chemical Vapor Deposition: Principles, Technology and Applications

ISBN-13: 9780815514329 / Angielski / Twarda / 1999 / 506 str.

Hugh O. Pierson

Opis

Reviews the chemical vapor deposition (CVD) process and its many applications for coatings, powders, fibers, and monolithic components. Individual chapters discuss the CVD of metals, allotropes of carbon, non-metallic elements, and ceramic materials. The second edition updates coverage of plasma CVD

Recenzje

"...presents an objective and systematic assessment." --High Tech Ceramics News

Spis treści

Introduction and General ConsiderationsFundamentals of Chemical Vapor DepositionThe Chemistry of CVDMetallo-Organic CVD (MOCVD)CVD Processes and EquipmentThe CVD of MetalsThe CVD of the Allotropes of CarbonThe CVD of Non-Metallic ElementsThe CVD of Ceramic Materials: CarbidesThe CVD of Ceramic Materials: NitridesThe CVD of Ceramic Materials: OxidesThe CVD of Ceramic Materials: Borides, Silicides, III-V Compounds and II-VI Compounds (Chalcogenides)CVD in Electronic Applications: SemiconductorsCVD in Electronic Applications: Conductors, Insulators, and Diffusion BarriersCVD in Optoelectronic and Ferroelectric ApplicationsCVD in Optical ApplicationsCVD in Wear- and Corrosion-Resistant ApplicationsCVD in Cutting-Tool ApplicationsCVD in Fiber, Powder, and Monolithic ApplicationsConversion GuideAppendix: Alternative Processes for Thin-Film Deposition and Surface Modification