Chemical Vapour Deposition of Main Group Metal Oxides and Phosphides » książka
Chemical Vapour Deposition of Main Group Metal Oxides and Phosphides
ISBN-13: 9783639140699 / Angielski / Miękka / 2009 / 128 str.
Chemical vapour deposition is an important technological process employed in a variety of industries to produce thin films of functional materials. It is a particularly important process in the semi-conductor and micro-electronics industries. It is an increasingly important technique in the glazing industry and in new materials discovery. This book provides information on the chemical vapour deposition setup and process, the deposition and characterisation of main group metal phosphides and oxide compounds, the use of metal oxide thin films in solid state metal oxide semi-conductor gas sensor devices as well as insight in to new chemical vapour deposition techniques. This manuscript is aimed at those working in the area of thin films both in industry and academia, and is especially applicable to those interested in the development of new techniques.
Chemical vapour deposition is an important technological process employed in a variety of industries to produce thin films of functional materials. It is a particularly important process in the semi-conductor and micro-electronics industries. It is an increasingly important technique in the glazing industry and in new materials discovery. This book provides information on the chemical vapour deposition setup and process, the deposition and characterisation of main group metal phosphides and oxide compounds, the use of metal oxide thin films in solid state metal oxide semi-conductor gas sensor devices as well as insight in to new chemical vapour deposition techniques. This manuscript is aimed at those working in the area of thin films both in industry and academia, and is especially applicable to those interested in the development of new techniques.
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