Basic Vacuum Technology, 2nd Edition

ISBN-13: 9780750304955 / Angielski / Twarda / 1998 / 100 str.

A. Chambers; Walmley Fitch; Sutton Coldfield

Opis

An introductory text on how to use vacuum techniques. It provides a grounding in the basic scientific principles and concepts which underlie the production and measurement of vacua. This edition includes more worked examples, more information on basic gas properties, and an expanded approach to changed needs in vacuum applications in semiconductor processing.

Recenzje

"… a very useful text which is an up-to-date introduction appropriate to new research students so that they can approach UHV equipment with confidence."
-D.K. Ross, Director, Science Research Institute, University of Salford, UK

"…much useful information on gas behaviour and surface cleaning."
-Howard Tring, BOC Edwards, Wilmington, MA, USA

Spis treści

Preface to the First EditionPreface to the Second EditionAcknowledgmentsIntroductionGASESMoleculesBondingIonsMasses of atoms and moleculesBonding, energy and temperatureSolids, liquids and gasesThe kinetic description of a gasResults from kinetic theoryVapour pressure, evaporation and condensationGases and vapoursMacroscopic gas lawsGas mixtures and partial pressuresContinuum and molecular states of gas, Knudsen, number Kn = lambda/^IDHeat conduction in gasViscosity of gasesGas-surface scattering and molecular dragThermal transpirationSummaryReferencesGASES IN VACUUM SYSTEMSThe basic task, units and ranges of vacuaFormulas for important quantitiesQualitative description of the pumping processSurface processes and outgassingGas flow - formalitiesGas flow - mechanismsMolecular flow conductance of an apertureMaximum speed of a pump in the molecular flow regionMolecular flow through pipes - transmission probability and conductanceQuantitative description of the pumping processSummaryReferencesPUMPSPositive displacement pumpsKinetic pumpsEntrapment (capture) pumpsPump selectionMEASUREMENT OF PRESSURETotal pressure gaugesHydrostatic pressure gaugesThermal conductivity gaugesIonisation gaugesSpecial gauges for the low UHV and XHV regionsSpining rotor gauge (SRG)Calibration of vacuum gaugesPartial pressure gaugesThe magnetic sector analyzerThe quadropole residual gas analyzerDisplay of spectraInterpretation of spectraSummaryReferencesVACUUM MATERIALS AND COMPONENTSProperties requiredCommonly used materialsSealsCeramics and glassesPump fluidsFlangesFittingsMachining and construction of componentsSummaryAcknowledgementsReferencesCLEANINGGeneral considerationsProcedure selectionCleaning proceduresPackagingGeneral cleaning techniques Special cleaning processesCleaning of vacuum components and plant after useSummaryAcknowledgementsLEAKS AND LEAK DETECTIONReal and virtual leaksMethods of leak detectionLeak detectorsSummaryReferencesSYSTEMSSimple rotary pumped systemDiffusion pumped systemA turbo molecular pumped systemUltra-high vacuum systemA cryo-pumped systemA large fully automated, multi-pumped systemA particle accelerator pumping systemSummaryReferencesAPPENDICESMaximum evaporation rate from a surfaceMolecular dragReynolds' number Re expressed in terms of throughput QThe Knudsen cosine lawA derivation of the Knudsen formula for molecular flow through a pipeAnalysis of a simple systemSystems with distributed volumeSpecifying and measuring flowSpecifying and measuring flowThe maintenance of vacuum equipmentFurther ReadingStandard Graphic SymbolsList of Symbols Used in the TextList of Units Used in the TextIndex

O autorze

A. Chambers