Chemical Solution Deposition of Functional Oxide Thin Films

ISBN-13: 9783709119150 / Angielski / Miękka / 2016 / 796 str.

Theodor Schneller; Rainer Waser; Marija Kosec

Opis

This is the first text to cover all aspects ofsolution processedfunctional oxide thin-films. Chemical Solution Deposition (CSD) comprises all solution based thin- film deposition techniques, which involve chemical reactions of precursors during the formation of the oxide films, i. e. sol-gel type routes, metallo-organic decomposition routes, hybrid routes, etc. While the development of sol-gel type processes for optical coatings on glass by silicon dioxide and titanium dioxide dates from the mid-20th century, the first CSD derived electronic oxide thin films, such as lead zirconate titanate, were prepared in the 1980 s. Since then CSD has emerged as a highly flexible and cost-effective technique for the fabrication of a very wide variety of functional oxide thin films. Application areas include, for example, integrated dielectric capacitors, ferroelectric random access memories, pyroelectric infrared detectors, piezoelectric micro-electromechanical systems, antireflective coatings, optical filters, conducting-, transparent conducting-, and superconducting layers, luminescent coatings, gas sensors, thin film solid-oxide fuel cells, and photoelectrocatalytic solar cells. In the appendix detailed cooking recipes for selected material systems are offered."

Spis treści

Introduction.-Solution Chemistry;Simple alkoxide based precursor systems;Carboxylate based precursor systems;Single-source precursors;Acqueos Precursor Systems; Solution Synthesis Strategies.-Analytical Methods; Introduction;Thermal Analysis;NMR Sepctroscopy;EXAFS; Other Methods (XRM, SEM,TEM;scattering methods at nanocrystalline films);Spin-Coating;Dip Coating; Inkjet Printing and Other Direct Writing Methods(dip point and imprint techniques);Chemical Bath Deposition; Polymer Assisted Deposition.-Processing and Crystallization;Thermodynamics and Heating Processes;Material Systems Dominated by Heterogeneous Nucleation; Material Systems Dominated by Homogeneous Nucleation; Low Temperature Processing; Epitaxial Films; Powder Assisted Film Fabrication; UV-and E-Beam Direct Patterning of Photosensitive CSD Films; Template Controlled Growth.-Functions and Applications;Introduction;Integrated Capacitors; Base Metal Electrodes;Polar Oxide Films for MEMS Applications;Conducting Films and Electrodes; Transparent conducting oxides; Superconducting Films;Porous Films for Gas Sensors; Luminescent Fims.-Appendix; Synthesis for Standard material Systems.