Project Report from the year 2014 in the subject Chemistry - Other, grade: 1.0, Dresden Technical University (Technische Universitat Dresden), course: Semiconductor Technology, language: English, abstract: Atomic Layer Deposition (ALD) is a special type of Chemical Vapor Deposition (CVD) technique based on self-terminating sequential gas reactions for a conformal and precise growth down to few nanometers range. Ideally due to the self-terminating reactions, ALD is a surface-controlled process, where process parameters other than the choice of precursors, substrates, and deposition temperature...
Project Report from the year 2014 in the subject Chemistry - Other, grade: 1.0, Dresden Technical University (Technische Universitat Dresden), course:...