Contributes to the simulation of contaminated ground water developed from models about the disposal of contaminated material, i.e. radioactive fuels or chemical waste products. The equation in this book is used for the modelling of a radionuclide transport

This book discusses the study of simulating the growth of a thin film by chemical vapour deposition (CVD) processes. In recent years, due to the research in producing high-temperature films by depositing low pressures, the processes have increased and understanding the control mechanism of such processes has become very important. An underlying hierarchy of models for low-temperature and low-pressure plasma is presented in order to discuss the processes that can be used to implant or deposit thin layers of important materials. Due to the multi-scale problem of the flow and reaction processes,...