The deposition of amorphous carbon films is made on Silicon substrate Si (100), using a low energy (1.4 kJ) dense plasma focus (DPF). Silicon (100) substrates are placed in front of the graphite inserted anode at 5 cm distance for different angular positions with respect to the anode axis. The films are deposited using 25 focus shots at an optimum pressure of 0.75 mbar, by using argon as medium gas. The structural information of these deposited films is carried out by using Raman Spectroscopy Raman which shows the deposition of both graphite type trigonal sp DEGREES2 and diamond type...
The deposition of amorphous carbon films is made on Silicon substrate Si (100), using a low energy (1.4 kJ) dense plasma focus (DPF). Silicon (100) su...
