In this book is presented the preparation of Tellurium and Tellurium oxide thin films by cold spray process on different substrates at different deposition angles using helium gas as cold spray process and powder carrier gas without employing any catalyst. Characterization of the prepared thin films by X- ray diffraction analysis (XRD), and Scanning Electron Microscopy (SEM) in addition to Atomic Force Microscopy (AFM). The thin films exhibited a high transmission rate, which allows the products to have potential applications in transparent devices. Thus, the thin films demonstrated their...