Germanium as a replacement for Silicon in MOS devices, offers a higher electron (2x) and hole (4x) mobility than Si. A Ge channel MOS technology has been expected to be implemented into future high-speed Si platform, because of the enhanced carrier transport. The poor quality of the native oxide (GeO2) however hampered the use of this material in large scale production. One potential solution is the use of Rare-earth oxides (REOs) such as CeO2, La2O3, Dy2O3, Gd2O3, which can be directly deposited on Ge-substrates. The reliability characteristics of these CMOS devices on Ge-substrates are of...