This Thesis discusses the basic principles of Lithographic techniques incorporating the use of positive and negative photoresists applications, synthetic techniques of photo imaging compounds and light sensitive materials, uses of novel chlorinating agents at mild conditions, direct esterification of sulfonicacid or salts, photochemical studies of photo activating compounds, resolution and optimization of the photo imaging compounds in nanolithographic applications. Preparative and HPLC standardization methods of photo activating compounds. Synthesis of photo acid generators for...