The second Edition of the Handbook of Silicon Wafer Cleaning Technology is intended to provide knowledge of wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits. The integration of the clean processes into the device manufacturing flow will be presented with respect to other manufacturing steps such as thermal, implant, etching, and photolithography processes. The Handbook discusses both wet and plasma-based cleaning technologies that are used for removing contamination, particles, residue, and photoresist from wafer surfaces. Both the process...
The second Edition of the Handbook of Silicon Wafer Cleaning Technology is intended to provide knowledge of wet, plasma, and other surface cond...
Vollstandigkeit erheben. Daneben werden noch zahlreiche Hin weise sowohl zur Charakterisierung durch Derivate wie auch durch physikalische Methoden gegeben. Wir haben weiterhin den Abschnitt uber "Arbeitsmethoden" und insbesondere die chromatographischen und spektroskopischen Methoden erganzt. Da es aber unmoglich ist, diese Methoden im notwendigen Umfange aufzunehmen, haben wir weiterfuhrende Monographien angefUhrt und an den entsprechenden Stellen zitiert. So findet der Leser bei den einzelnen Verbindungsklassen z. B. bei den Phenolen, den Aminosiiuren, den Aldehydderivaten, welche...
Vollstandigkeit erheben. Daneben werden noch zahlreiche Hin weise sowohl zur Charakterisierung durch Derivate wie auch durch physikalische Methoden ge...
Handbook of Silicon Wafer Cleaning Technology, Third Edition, provides an in-depth discussion of cleaning, etching and surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet and plasma processing are reviewed, including surface and colloidal aspects. This revised edition includes the developments of the last ten years to accommodate a continually involving industry, addressing new technologies and materials, such as germanium and III-V compound semiconductors, and reviewing the various techniques and methods for cleaning and...
Handbook of Silicon Wafer Cleaning Technology, Third Edition, provides an in-depth discussion of cleaning, etching and surface conditioning...