Modern technology depends on materials with precisely controlled properties. Ion beams are an excellent way to achieve controlled modification of surface and near-surface regions. In every integrated circuit production line, for example, there are ion implantation systems. In addition to integrated circuit technology, ion beams can modify the mechanical, tribological, and chemical properties of metal, intermetallic, and ceramic materials without altering their bulk properties. Ion-solid interactions are the foundation that underlies the broad application of ion beams to the modification of...
Modern technology depends on materials with precisely controlled properties. Ion beams are an excellent way to achieve controlled modification of surf...
Modern technology depends on materials with precisely controlled properties. Ion beams are a favored method to achieve controlled modification of surface and near-surface regions. In every integrated circuit production line, for example, there are ion implantation systems. In addition, in integrated circuit technology, ion beams are used to modify the mechanical, tribological, and chemical properties of metal, intermetallic, and ceramic materials without altering their bulk properties. Ion-solid interactions are the foundation that underlies the broad application of ion beams to the...
Modern technology depends on materials with precisely controlled properties. Ion beams are a favored method to achieve controlled modification of surf...
Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of implantation. Ion beam processing can also be used to improve corrosion resistance, to harden surfaces, to reduce wear and, in general, to improve materials properties. This book presents the physics and materials science of ion implantation and ion beam modification of materials. It covers ion-solid...
Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation s...
Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. This book presents the physics and materials science of ion implantation and ion beam modification of materials.
Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation s...
This study focuses on the emerging class of new materials characterized by ultra-fine microstrucures. The NATO ASI which produced this book was an international scientific meeting devoted to a discussion of the mechanical properties and deformation behaviour of materials having grain sizes down to a few nanometers.
This study focuses on the emerging class of new materials characterized by ultra-fine microstrucures. The NATO ASI which produced this book was an int...
