High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications

ISBN-13: 9780128124543 / Angielski / Miękka / 2019 / 398 str.

Daniel Lundin; Jon Tomas Gudmundsson; Tiberiu Minea

Spis treści

1. Introduction (particle surface interaction) 2. Power coupling 3. HiPIMS process characteristics 4. Reactive HiPIMS 5. HiPIMS modeling 6. Physics of HiPIMS 7. HiPIMS thin films 8. Industrialization of HiPIMS

O autorze

Daniel Lundin, Ph.D., has been working in the field of thin film synthesis using plasma-based techniques. His current research is focused on understanding and characterizing low-pressure plasma discharges, in particular the thin film plasma deposition technique High Power Impulse Magnetron Sputtering (HiPIMS) and magnetron sputtering as a new type of surface coating technique. In 2008 his research on the HiPIMS process was awarded the Institute of Physics Prize for novelty, significance and potential impact on future research. In 2009 he was ranked as one of Sweden's young 'Supertalents' by the Swedish business journal Veckans Affärer. Dr. Lundin has published more than 40 papers on HiPIMS and is currently working as a senior researcher at the University of Paris-Sud/CNRS. Tiberiu Minea, Ph.D. is currently serving as the Director the Laboratory of Physics and Gases and Plasmas at the University of Paris-Sud where he heads the group researching the theory and modeling of plasmas - discharge and surfaces. He is the President of the French Federation of Scientific Societies, as well as the president of Scientific and Technical Committee of SFV. Dr. Minea has published over 84 peer reviewed articles and has been an invited speaker at numerous conferences for his work on HiPIMS. Jon Tomas Gudmundsson has spent the last 18 years as a professor at the University of Iceland both within the Physics and Engineering schools. He holds a Ph.D. from the University of California, Berkeley, in Nuclear Engineering and his current field of study includes the characterization of the high power impulse magnetron sputtering (HiPIMS) discharge using a Langmuir probe, as well as plasma characterization, plasma chemistry and photovoltaics. He was the keynote speaker at the 4th Magnetron, Ion Processing & Arc Technologies European Conference in December 2015 where he presented a paper on The current waveform in reactive high power impulse magnetron sputtering.