ISBN-13: 9783319892283 / Angielski / Miękka / 2019 / 421 str.
ISBN-13: 9783319892283 / Angielski / Miękka / 2019 / 421 str.
Part 1: Plasma Based X-Ray Lasers and Applications (10 papers).-
Chapter 1. Overview of Laser-driven Coherent Short-wavelength Sources at PALS and ELI Beamlines (Invited).-
Chapter 2. High Average Power Table-Top Soft X-Ray Lasers Using Diode-Pumped Laser Drivers (Invited).-
Chapter 3. Progress and Prospects of X-ray Laser Research at QST.-
Chapter 4. DAGON: a 3D Maxwell-Bloch Code.-
Chapter 5. Plasma-Source High-Resolution XUV Spectroscopy as Complementary to Beamlines Limitations (Invited).-
Chapter 6. The creation of radiation dominated plasmas using laboratory X-ray lasers (Invited).-
Chapter 7. Plasma Dynamics in Capillary Discharges (Invited).-
Chapter 8. MHD Simulation of Various Cross-Section Capillary Discharges.-
Chapter 9. Towards Generation of Sub-fs Pulses Using Lasing to Ground States of H-like LiIII at 13.5nm and He-like CV at 4nm.-
Chapter 10. Numerical Calculation of Gain Coefficient for Recombination X-Ray Lasers in a Carbon Cluster plasma.-
Part 2: Higher Harmonics and FEL Based X-Ray Lasers (10 papers).-
Chapter 11. Investigations on Ultrafast Atomic and Molecular Dynamics with Harmonic Sources (Invited).-
Chapter 12. Characterization of partially coherent ultrashort XUV pulses (Invited).-
Chapter 13. High-Order Harmonic Generation by Relativistic Plasma Singularities: the Driving Laser Requirements (Invited).-
Chapter 14. Wave-Mixing and Amplification in the Extreme Ultraviolet Region.-
Chapter 15. HHG beam wavefront characterization at 30 nm.-
Chapter 16. Using the X-FEL to drive gain in K-shell and L-shell systems using photo-ionization and photo-excitation of inner-shell transitions (Invited).-
Chapter 17. Superfluorescence/Superradiance in Helium Following Free-Electron-Laser Excitation.-
Chapter 18. In Situ Characterization of XFEL Beam Intensity Distribution and Focusibility by High Resolution LiF Crystal X-Ray Detector.-
Chapter 19. Achieving Laser Wakefield Accelerated Electron Beams of Low Enough Energy Spread for an X-FEL.-
Chapter 20. Proposal for Experiment Systems Using Laser Driven Heavy Ions and XFELs to Understand Physical Phenomena Occurring near the Incident Ion Path.-
Part 3: Ultrafast X-Rays and Applications (11 papers).-
Chapter 21. Laser driven plasma based incoherent X-ray sources at PALS and ELI Beamlines (Invited).-
Chapter 22. Research on Laser Acceleration and Coherent X-ray Generation using J-KAREN-P laser (Invited).-
Chapter 23. X-rays driven by Single-Cycle, Petawatt Lasers: A Path to Exawatt Pulses.-
Chapter 24. Ultraintense X-Ray Radiation Photopumping of Exotic States of Matter by Relativistic Laser Plasma in the Radiation-Dominated Kinetic Regime (RDKR) (Invited).-
Chapter 25. Enhanced coherent Thomson scattering in the few-cycle regime.-
Chapter 26. Plasma channel undulator for narrow-bandwidth X-ray generation.-
Chapter 27. Three-dimensional Supersonic Sapphire Micronozzles for Laser-Plasma Wakefield Accelerators.-
Chapter 28. Generating ultrahigh brilliance quasi-monochromatic MeV -rays with high-quality LWFA electron beams.-
Chapter 29. Features of Induced X-Ray Radiation and Possible Tandem FEL Realization on Channeling Particles.-
Chapter 30. Features of Resonant Absorption and Short-Wavelength Laser Amplification in Realistic Media.-
Part 4: Alternative X-Rays and Applications (5 papers).-
Chapter 31. Observation and Investigation of Intensive Directional Quasi-coherent X-Ray Generated at Interaction of Cavitating Liquid Jet with a Target.-
Chapter 32. Laser Plasma X-ray Source Based on Cryogenic Targets.-
Chapter 33. Photoionization of Atomic Neon Induced Using Nanosecond Pulses of Extreme Ultraviolet (EUV).-
Chapter 34. Effects of Equation of State on fluid simulations for laser-produced plasmas.-
Part 5: X-Ray Imaging (9 papers).-
Chapter 35. Soft X-Ray Laser Ablation Mass Spectrometry for Chemical Composition Imaging in Three Dimensions (3D) at the Nanoscale (Invited).-
Chapter 36. Coherent Diffraction Imaging with Table-top XUV Sources (Invited).-
Chapter 37. X-ray reflection imaging of inclined and obliquely illuminated objects (Invited).-
Chapter 38. Nanoscale Imaging using a Compact Laser Plasma Source of Soft X-rays and Extreme Ultraviolet (EUV) (Invited).-
Chapter 39. ERL-based Laser-Compton Scattering X-ray source for X-ray Imaging.-
Chapter 40. 2D and 3D nanoscale imaging using high repetition rate laboratory based soft X-ray sources (Invited).-
Chapter 41. The Observation Of Transient Thin Film Structures During The Femto-Second Laser Ablation Process By Using The Soft X-Ray Laser Probe.-
Chapter 42. Spectrally-resolved spatial interference for single-shot temporal metrology of ultrashort soft X-ray pulses.-
Part 6: X-Ray Optics and Damage (9 papers).-
Chapter 43. Multilayer Mirrors for Focusing Objective in 40-nm Wavelength Region.-
Chapter 44. Manufacture of High Precision, Multilayer Based Polarimeter Designed for Wide Energy Range from EUV to Soft X-ray.-
Chapter 45. Proposal of Hypereutectic AlSi-based Multilayer Mirrors for Wavelength between 20 nm and 25 nm.-
Chapter 46. Irradiation damage test of Mo/Si, Ru/Si and Nb/Si multilayers using the soft X-ray laser built at QST.-
Chapter 47. Mo/Si Multilayer-Coated Photodiode Detector for Monitoring Soft X-Ray Laser Intensity .-
Chapter 48. Analysis of Reflection Signal from EUV Multilayer Mirror for Irradiation Induced Damage Study.-
Chapter 49. Investigation of surface excitation effect for ablation of 4H-SiC substrate using double-pulse beam.-
Chapter 50. Ablation of LiF and CsI by EUV Nanosecond Laser Pulse.-
Chapter 51. Laser-Induced Damage on Silica Glasses by Irradiation of Soft X-Ray Laser Pulse.-
Part 7: EUV Lithography (7 papers).-
Chapter 52. Performance of over 100W HVM LPP-EUV light source (Invited).-
Chapter 53. EUV free-electron laser requirements for semiconductor manufacturing (Invited).-
Chapter 54. Coherent Lithography with Table Top Soft X-ray Lasers: Latest Achievements and Prospects (Invited).-
Chapter 55. A 10-Hz short pulse CO2 laser system for extreme ultraviolet source.-
Chapter 56. Modeling of Ablation of the Target Material for the Plasma for Coherent and Incoherent EUV Sources.-
Chapter 57. Surface Layer Modification of Metal Nanoparticle Supported Polymer by Irradiation of Laser Driven Extreme Ultraviolet Light.-
Chapter 58. Micrometer-scaled photo direct machining of polydimethylsiloxane using laser plasma EUV radiations.-
Part 8: Instrumentation for Advanced X-Ray Applications (5 papers).-
Chapter 59. Broadband High-Resolution Imaging Spectrometers for the soft X-Ray Range.-
Chapter 60. Development of soft X-ray microscope in Water-window using laser produced plasma light source.-
Chapter 61. Development of time-resolved small-angle X-ray scattering system using soft-X-ray laser.-
Chapter 62. Development of a High Repetition Rate and High Pulse Energy Nd:YAG MOPA Laser System.-
Chapter 63. Evaluation of a flat-field grazing incidence spectrometer for highly charged ion plasma emission in 110 nm.
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