Ultra-Clean Technology Handbook : Volume 1: Ultra-Pure Water

ISBN-13: 9780824787530 / Angielski / Twarda / 1993 / 944 str.

Ohmi; T. Ohmi; Tadahiro Ohmi

Opis

Evaluating the effectiveness of conventional wet processes for cleaning silicon wafers in semiconductor production, this reference reveals concrete measures to improve ultrapure water quality reviewing the structure and physical characteristics of ultrapure water molecules. The volume is divided int

Spis treści

"Quality of Ultrapure Water Requirements for Ultrapure Water, Takaaki Fukumoto The Structure of Water, Shoji Kubota Wafer Cleanliness and Requirements for Ultrapure Water Quality, Yoshiaki Matsushita Properties of Ultrapure Water, Shoji Kubota Afterword, Takaaki Fukumoto Ultrapure Production Systems Introduction, Koichi Yabe Pretreatment System, Kenichi Ushikoshi The Primary Treatment System, Isamu Sugiyama and Yoshitaka Yamaki Ultrapure Water System, Koichi Yabe Piping System, Takeshi Shinoda Reuse of Wastewater, Riichi Ikegami Field Data Operation Data for Actual Units, Ikuo Shindo Examples of Operation Data, Yoshito Motomura Operation Management and Cost, Hiromi Kohmoto Hot Ultrapure Water System, Yoshito Motomura Afterword, Koichi Yabe Elementary Technology Introduction, Yoshiharu Ohta Membranes Membrane Technology, Norihisa Urat Ultrafiltration, Hiroaki Ishikawa Membrane Filtration, Koichi Sawada Ion-Exchange Resin, Kenji Oda Deaeration Technology, Hitoshi Sato Sterilization Technique, Masao Saito TOC Removal Technology, Tetsuo Mizuniwa Static Electricity Removal Method, Takeo Makabe Afterword, Yoshiharu Ohta Equipment and Piping Materials Introduction, Takeshi Shinoda Piping, Koichi Yabe Valves and Fittings, Mitsugu Abe Pumps, Takashi Imaoka Tanks, Koichi Wada Heat Exchangers, Kazuhiko Takino Afterword, Takeshi Shinoda Instrumentation Introduction, Tetsuo Mizuniwa Instruments for Operational Control, Kazuhiko Takino On-Line Monitors High-Sensitivity Resistivity Meter, Makoto Saito TOC Monitor, Masami Miura Automatic TOC Analyzer: Wet Oxidation at High Temperature and Pressure, Yoshio Senoo Ultraviolet-Promoted Chemical Oxidation TOC Analyzer, Yoshiki Shibata Particle Counter, Hirotake Shigemi and Toshio Kumagai Nano-Sized Particle Analyzer (Nanolyzer), Takashi Sasaki Particle Counter for Fine Particles in Ultrapure Water, Toshiki Manabe High-Purity Monitor, Seiichi Inagaki Total Solids Monitor, Sankichi Takahashi and Toshihiko Kaneko Silica Analyzer for Ultrapure Water, Makoto Satoda Dissolved Oxygen Meter, Shin'ichi Akazawa ATP Monitor, Toshiki Manabe Ozone Monitor, Akira Yamada Afterword, Tetsuo Mizuniwa Fabrication and Construction Technologies Foreword, Akihiko Hogetsu Cleaning Methods Cleaning and Installation of Polyvinyl Chloride Piping, Yukio Hamano Polyvinylidene Fluoride Pipes, Fittings, and Valves, Hiroto Fujii, Shosuke Ohba, and Junsuke Kyomen Polyether Ether Ketone Pipes and Fittings, Katsuhito Ito Synthetic Resin Valves, Tomoyuki Ueda Electropolished Pipe, Shigeharu Nakamura Gold-Electropolished Pipe, Katsumi Yamazoe Oxidation-Passivated Stainless Steel Pipe, Yasuyuki Yagi and Motohiro Okazaki Stainless Steel Valves Common SUS Valves, Mamoru Torii Metal Diaphragm Valves, Yoh'ichi Kanno Stainless Steel Pumps Ultraclean Regenerating SUS Pumps, Rokuheiji Satoh Canned Motor Pumps, Kotaro Karita Towers and Tanks, Katsumi Yamazoe Gages and Meters Pressure Gages, Shigenori Hokai Flowmeters, Yoshiaki Hashimoto Fabrication and Construction Polyvinyl Chloride Pipe Installation, Yukio Hamano Polyvinylidene Fluoride Installation, Hiroto Fujii, Shosuke Ohba, and Junsuke Kyomen Polyether Ether Ketone, Yoshito Motomura SUS Piping, Katsumi Yamazoe Support Structure, Nobuyuki Hirose Equipment Installation, Nobuyuki Hirose Clean Room Piping, Nobuyuki Hirose Afterword, Akihiko Hogetsu Analytical Technology for Ultrapure Water Foreword, Katsumi Koike Resistivity, Akira Yamada Particles Measurement of Particles, Tetsuo Mizuniwa Automatic Microscopy Employing Image-Processing Technology, Hisanao Kano Ultrapure Water and Bacteria, Minami Isuchizaki Total Organic Compounds, Sachio Satoh and Toshiki Manabe Trace Metals and Ions, Yukinobu Sato Quantitative Determination of Silica in Ultrapure Water, Ikuo Shindo Colloids, Takaaki Fukumoto, Masaharu Hama, and Motonori Yanagi Dissolved Oxygen, Nobuko Hashimoto Total Solids Monitor: Measurement of Residue on Evaporation, Sankichi Takahashi and Toshihiko Kaneko Ultrapure Water Evaluation by the Water Spot Method, Michiya Kawakami, Makoto Ohwada, Yasuyuki Yagi, and Tadahiro Ohmi Afterward, Katsumi Koike Wet Processing Foreword, Michiya Kawakami Outline, Michiya Kawakami and Tadahiro Ohmi Wet Etch Cleaning Cleaning Unit, Hiroyuki Horiki and Tako Nakazawa Isopropyl Alcohol Vapor Drying Technology, Hiroyuki Mishima Spin Drying, Seiichiro Aigo Water Spot Growth Conditions, Michiya Kawakami, Yasuyuki Yagi, Tadahiro Ohmi, and Motohiro Okazaki Chemistry of Wet Etch Cleaning Physical Chemistry of Etch Cleaning, Tesuo Mizuniwa, Mitsuo Abe, and Hiroyuki Mishima Surface Chemistry of BHF, Nobuhiro Miki and Hirohisa Kikuyama Suppression of Native Oxide, Michiya Kawakami, Makoto Ohwada, Yasuyuki Yagi, and Tadahiro Ohmi Moisture Adsorption on Silicon Wafers, Norikuni Yabumoto and Hiroyuki Harada High-Temperature, High-Pressure Ultrapure Water Spray-Cleaning Technology, Yusuyuki Yagi, Michiya Kawakami, Kenichi Sato, and Tadahiro Ohmi The Future of Wet Processing, Tadahiro Ohmi, Ichiro Kawanabe, Masayuki Miyashita, and Frederick W. Kern, Jr. Future Tasks for Ultrapure Water Future Challenges for Ultrapure Water, Hiroyuki Harada Development of a Complete Ultrapure Water System, Takaaki Fukumoto "

O autorze

Ohmi\,