Thin Film Analysis by X-Ray Scattering

ISBN-13: 9783527310524 / Angielski / Twarda / 2006 / 378 str.

Germany) Birkho Frankfurt/Oder Mario (IHP Microelectronics

Opis

With contributions by Paul F. Fewster and Christoph Genzel

While X-ray diffraction investigation of powders and polycrystalline matter was at the forefront of materials science in the 1960s and 70s, high-tech applications at the beginning of the 21st century are driven by the materials science of thin films. Very much an interdisciplinary field, chemists, biochemists, materials scientists, physicists and engineers all have a common interest in thin films and their manifold uses and applications.
Grain size, porosity, density, preferred orientation and other properties are important to know: whether thin films fulfill their intended function depends crucially on their structure and morphology once a chemical composition has been chosen. Although their backgrounds differ greatly, all the involved specialists a profound understanding of how structural properties may be determined in order to perform their respective tasks in search of new and modern materials, coatings and functions. The author undertakes this in-depth introduction to the field of thin film X-ray characterization in a clear and precise manner.

Recenzje

"... this book should prove very useful to anyone..."
Material Characterization

Spis treści

Principles of X–Ray Diffraction
Identification of Chemical Phases
Line Profile Analysis
Grazing Incidence Configurations
Texture and Preferred Orientation
Residual Stress Analysis
High Resolution X–ray Diffraction

O autorze

Dr. Mario Birkholz was born 1958 in Hamburg, Germany. He studied physics at the Free University of Berlin and completed his diploma thesis on structural investigations of biological membranes in 1986, and obtained his Ph.D. on the structure of stoichiometry deviations in iron–pyrite in 1990. Research positions at Hahn–Meitner–Institut Berlin, at Fraunhofer Institute for Thin Film and Surface Technology, Braunschweig, and at IHP Microelectronics, Frankfurt (Oder), followed.
He is involved in the development of thin film systems for applications in photovoltaics, sensor technology and as protective coatings. His main scientific interest is focused on the structure and morphology of thin films, their investigation by x–ray scattering techniques and the relation between structure and function.

Blurb

While X–ray diffraction investigation of powders and polycrystalline matter was at the forefront of materials science in the 1960s and 70s, high–tech applications at the beginning of the 21st century are driven by the materials science of thin films. Very much an interdisciplinary field, chemists, biochemists, materials scientists, physicists and engineers all have a common interest in thin films and their manifold uses and applications.
Grain size, porosity, density, preferred orientation and other properties are important to know: whether thin films fulfill their intended function depends crucially on their structure and morphology once a chemical composition has been chosen. Although their backgrounds differ greatly, all the involved specialists a profound understanding of how structural properties may be determined in order to perform their respective tasks in search of new and modern materials, coatings and functions. The author undertakes this in–depth introduction to the field of thin film X–ray characterization in a clear and precise manner.