The Foundations of Vacuum Coating Technology

ISBN-13: 9780128130841 / Angielski / Miękka / 2018 / 378 str.

Donald M. Mattox

Spis treści

1. About This Book2. Vacuum Technology3. Plasmas and Plasma Enhanced CVD (PECVD)4. Physical Sputtering and Sputter Deposition5. Thermal Evaporation and Deposition in Vacuum6. Cathodic Arc Vaporization and Cathodic Arc Vapor Deposition7. Ion Plating8. Condensation, Nucleation, Interface Formation, and Film Growth

Appendix1. Historical Timelines2. Glossary of Terms and acronyms

O autorze

Donald M. Mattox obtained his B.S degree in Physics from Eastern Kentucky State University. He served as a meteorologist and Air Weather Officer in the USAF during and after the Korean War. He then obtained a M.S. degree in Solid State Physics from the University of Kentucky in 1960. In 1961 he went to work at Sandia National Laboratories (SNL). Don was a manager and member of the Technical staff at SNL for 27 years and has been a consultant to the vacuum coating industry for over 28 years. In 1995 he was the recipient of the American Vacuum Society Albert Nerken Award "For his invention of the ion plating process and its continued development." In 2007 Don received the Society of Vacuum Coaters Nathaniel Sugerman Award "For his development of the ion plating process and long-term commitment to education in the vacuum coating community.” Don has published numerous papers and book chapters on the subject of Physical Vapor Deposition (PVD) processing and technology transfer from R&D to production. He is the author of Handbook of Physical Vapor Deposition (PVD) Processing (1st edition 1998, 2nd edition 2010) published by Elsevier and Foundations of Vacuum Coating Technology, published by William Andrew/Elsevier (1st edition 2003).