Sputtering by Particle Bombardment: Experiments and Computer Calculations from Threshold to Mev Energies

ISBN-13: 9783642079443 / Angielski / Miękka / 2010 / 509 str.

Rainer Behrisch

Opis

Earlier books on this subject, i.e. "Sputtering by Particle Bombardment I - III" are nearly 20 years old. Since then a lot of new and important work has been performed and published in international journals. The book gives an overview on all the new results. This concerns especially a new summary of the measured and calculated sputtering yields with an algebraic approximation formula for the energy and angular dependence of the yields. This is especially useful for all researchers who need sputtering yields for physics and/or applied problems. The computational methods for calculating sputtering yields are critically reviewed and molecular dynamics calculations are also included. The influence of chemical effects on sputtering and the new models developed in the last years for understanding these effects such as for hydrogen-ion bombardment of carbon are outlined. New developments such as sputtering by MeV ions and the mechanisms for understanding the effects are presented. The new results about the angular and energy distributions of sputtered atoms are presented in an extra chapter.

Spis treści

Introduction and Overview (R. Behrisch, W. Eckstein).- Computer Simulation of the Sputtering Process (W. Eckstein, H.M. Urbassek).- Sputtering Yields (W. Eckstein).- Results of Molecular Dynamics Calculations (H.M. Urbassek).- Energy and Angular Distributions of Sputtered Species (H. Gnaser).- Chemical Sputtering (W. Jacob, J. Roth).- Electronic Sputtering with Swift Heavy Ions (W. Assmann, M. Toulemonde, C. Trautmann) Subject Index

Blurb

This volume gives a comprehensive overview about the physical processes causing sputtering of solids at bombardment with energetic ions. The most important quantities are the sputtering yields, i.e. the average number of atoms eroded per incident ion. The latest results for the sputtering yields and their dependence on the incident energy and angle of incidence, as well as the energy and angular distributions of the sputtered atoms are presented. This concerns experimentally determined yields as well as a critical evaluation of the computational methods used to calculate the yields and distributions. The energies of the incident ions cover the range between a few eV up to several MeV. The influence of chemical effects between the incident ions and the atoms of the bombarded solid on the sputtering yields are also reviewed.