Shape and Functional Elements of the Bulk Silicon Microtechnique: A Manual of Wet-Etched Silicon Structures

ISBN-13: 9783642060489 / Angielski / Miękka / 2010 / 222 str.

Joachim Fruhauf

Opis

The idea for this manual was created by the author and Birgit Hannemann (now Professor at the University of Applied Sciences, Bremen, Germany) as an internal catalogue of results of several years of investigations at the Chemnitz University of Technology, Germany. At this base supplying investigations and the elabo- tion of the manuscript were supported by the Stiftung Industrieforschung, Bonn, Germany. In the course of this the coworkers of the author Eva Gartner, Steffi Kronert and Cornelia Kowol were directly involved. All the SEM pictures result from preparations performed at the Centre of - crotechnologies at the Chemnitz University of Technology (Head: Prof. Thomas Gessner). The author and his coworkers wish to express their thanks to Wolfgang Brauer (mask design), Norbert Zichner (processes), Iris Hobelt (SEM pictures) and the student Karin Preissler (manuscript layout support). In particular thanks are due to the Stiftung Industrieforschung for the financial support and to the Springer V- lag for the edition of this manual.

Spis treści

Technological Basis of Bulk-Silicon-Microtechnique.- Orientation Dependent Etching of Silicon.- General Overview of the Shape- and Functional Elements and the Procedure of their Design.- Simple Shape Elements.- Elements for Mechanical Applications.- Elements for Fluidic Applications.- Elements for Optical Applications.

Blurb

This methodic manual presents a survey of the form-related and functional elements of the bulk silicon microtechnique. It gives a systematic description of simple shape elements and of elements for mechanical, fluidic and optical applications. This manual includes practical instructions for the use of the relevant techniques and an extensive collection of examples for the support of the search for applications via photographs, drawings and references. It serves as a valuable guide to the design of etch masks and processes while summarizing the important properties of silicon, especially aiming at producers of sensors and microtechnical components, as well as producers of components of precision engineering and optical applications.