Run-To-Run Control in Semiconductor Manufacturing

ISBN-13: 9780849311789 / Angielski / Twarda / 2000 / 368 str.

James Moyne; Enrique del Castillo; A. M. Hurwitz

Opis

Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs," thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry's widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.

Spis treści

Introduction
What is Run-top-Run Control?
Target Audience
Purpose of this Book
Outline
Background
Current State-of-the-Art in Semiconductor Manufacturing Process Control
History of the Development of Run-to-Run Control
Current State o-of-the-Art in Run-to-Run Control Development and Deployment
Simple Example: Run-to-Run Control and Comparison to Statistical Process Control
Identifying Target Applications for Run-to-Run Control
Class of Applications that can Utilize Run-t0-Run Control
General Run-to-Run Control Development and Deployment Process
Issues in Deploying Run-to-Run Control
Developing a Run-to-Run Solution: Run-to-Run Algorithms
Introduction
Linear Approximation Algorithms
Higher Order Approximation Algorithms
Neural Network Algorithms
Other Approaches
Developing a Run-to-Run Solution: Practical Extensions to Algorithms
Developing and Deploying Run-to-Run Solutions:
Integrating Control
Introduction
The Generic Cell Controller
Other Approaches
Integrating into Factory-Wide Manufacturing System
Run-to-Run Solution Development, Deployment, and Customization Methodology
Introduction
Process Identification
Choosing a Run-to-Run Control Solution
Customizing the Run-to-Run Control Solution to the Process
Issues
Run-to-Run Control System Deployment Case Studies
Chemical-Mechanical Planarization
Vapor Phase Epitaxy
Advanced Topics
Feasibility Analysis of Run-to-Run Control Solutions
Stability Analysis of Run-to-Run Control Solutions
Combining Process Run-to-Run Control with Inter-Process Control
Conclusions
Summary of Run-to-Run Development and Deployment Process
Deploying Run-to-Run Control in a Timely and Cost Effective Manner
Overcoming Barriers to Deployment
Future Research and Development Issues
References

O autorze

James Moyne, Enrique del Castillo, Arnon M. Hurwitz