Processes in Photoreactive Polymers

ISBN-13: 9781461357124 / Angielski / Miękka / 2014 / 409 str.

V. V. Krongauz; A. D. Trifunac

Opis

The development of photosensitive materials in general and photoreactive polymers in particular is responsible for major advances in the information, imaging, and electronic industries. Computer parts manufacturing, information storage, and book and magazine publishing all depend on photoreactive polymer systems. The photo-and radiation-induced processes in polymers are also active areas of research. New information on the preparation and properties of com- mercially available photosensitive systems is constantly being acquired. The recent demand for environmentally safe solvent-free and water-soluble materials also motivated changes in the composition of photopolymers and photoresists. The interest in holographic recording media for head-up displays, light scanners, and data recording stimulated development of reconfigurable and visible light sensitive materials. Photoconductive polymerizable coatings are being tested in electrostatic proofing and color printing. The list of available initiators, poly- meric binders, and other coating ingredients is continually evolving to respond to the requirements of low component loss (low diffusivity) and the high rate of photochemical reactions.

Spis treści

Contributors; Preface; Section I: Photoreactive polymers: history and state of the art: Asphalt as the world's first photopolymer--Jean-Louis Marignier; Recent developments in radiation curing chemistry--Christian Decker; Section II: Processes in photoreactive polymers: Time resolved laser spectroscopy of excited state processes in photoimaging systems--Jean-Pierre Fouassier; Hexaarylbiimidazolyl: the choice initiator for photopolymers: history of synthesis and investigation of photochemical properties--Koko Maeda; Visible light photoinitiation systems based on electron and energy transfer process--Tsuguo Yamaoka and K. Naitoh; Investigation of electron transfer between hexaarylbiimidazole and visible sensitizer--Yi Lin, Andong Liu, and Alexander D. Trifunac; Diffusion in polymer matrix and anisotropic photopolymerization--Vadim V. Krongauz; Benzoin ether photoinitiators bound to acrylated prepolymers--Kwang-Duk Ahn; Photosensitive liquid crystalline polymers--Carolyn Bowry-Devereaux; Section III: Photosensitive polymer in advanced applications: Holographic recording materials--Roger A. Lessard, Rupak Changkakoti, and Gurusamy Manivannan; Photoresists and their development--Nigel P. Hacker.