Plasma Surface Modification and Plasma Polymerization

ISBN-13: 9781566763370 / Angielski / Twarda / 1996 / 280 str.

N. Inagaki; Inagaki Inagaki; Norihiro Inagaki

Opis

Describes the elementary principles of modifying the surface of polymers using plasma energy, which allows the underlying layers to remain unaffected. Considers interactions between plasma and polymeric materials, plasma graft copolymerization, implantation, and features and functions of plasma poly

Spis treści

Introduction

Plasma
Plasma State - Dissociation Energy - Energy for Ionization: Energy Transfer by Particle Collision, Energy Transfer by Photon Absorption - Cross Section of Collision - Properties of Plasma: Debye Length and Debye Shielding, Electron Temperature and Ion Temperature, Velocity Distribution Function - Plasma Generation - References
Interactions between Plasma and Polymeric Materials
Etching Reactions - Implantation Reactions - Radical Generation - Polymer Deposition - Polymer Deposition and Ablation - References
Plasma Graft Copolymerization
Radicals Created by Plasma - Plasma Graft Polymerization - Plasma Graft Polymerization and Photoinitiated Graft Polymerization - References
Surface Modification by Implantation
History of Implantation Process as Surface Modification - Chemistry of CASING Process - Mechanism of Implantation - Implantation by Remote Plasma - Hydrophilic Surface Modification by Implantation of Oxygen Functionalities - Hydrophilic Surface Modification by Implantation of Chlorine Functionalities - Hydrophobic Surface Modification by Implantation of Fluorine Functionalities - Implantation and Degradation - References
Plasma Polymerization
History of Plasma Polymerization - Plasma Polymerization Mechanism - Operational Parameters of Plasma Polymerization - Chemical Structure of Plasma Polymers - Design for Formation of Functional Plasma Polymers - References
Features and Functionalities of Plasma Polymers
Mechanical Properties of Plasma Polymers - Electrical Properties of Plasma Polymers - Chemical Sensor Devices Composed of Plasma Polymer Films: Humidity Sensor Devices, Sensing Mechanism of Gas Sensor Devices, Gas Sensor Devices Formed from Plasma Polymer Films - Permeation Properties through Plasma Polymer Films: Permeation Process, Membranes for Separation of Oxygen and Nitrogen, Membranes for Permeation of Water Vapor, Membranes for Separation of Ethanol and Water (Pervaporation Membranes) - Plasma Polymer Films Containing Cation or Anion Groups - Hydrophilic and Hydrophobic Plasma Polymer Films: Surface Energy of Polymers, Hydrophilic Plasma Polymer Films, Hydrophobic Plasma Polymer Films - Hard Coating by Plasma Polymer Films: SiOx Films from Plasma Polymerization of Alkoxysilanes, SiOx Films from Plasma Polymerization of Tetramethylsilane/Oxygen Mixtures - References

Index

More Than 200 Tables and Schematics

The 66 tables provide extensive reference data in convenient form. The 152 figures include schematics which illustrate reactions and processes. Here is a small sampling of this material.
Tables: - Plasmas and interactions between plasma and polymeric materials - Oxygen functionalities created at the surface of polyethylene films by plasmas - Surface energy for polyethylene films exposed to radical and plasma source - Elemental composition of polypropylene films treated with CCI4 plasma - Degradation of polymers - Electrical conductivity of typical plasma polymers - Permeability characteristics of plasma polymers formed from silicone compounds
Schematics: - Coupling systems for plasma generation - Transformation reactions of oxygen functional groups - Overall reactions of plasma polymerization - Direct irradiation method - Radical formation from polystyrene by plasma irradiation - Essential reactions in photo-induced graft polymerization - Degradation behavior - Rate constant of plasma polymerization - Comparison in polymerization rate among acetylene, ethylene, and ethane - Reaction steps in plasma polymerization - Domain of plasma polymer deposition - Energy diagram for adsorption of molecules at the surface of n-type semiconductors - Reactor for plasma polymerization

O autorze

Norihiro Inagaki