Plasma Processing of Semiconductors

ISBN-13: 9780792345671 / Angielski / Twarda / 1997 / 613 str.

P. F. Williams; P. F. Williams

Opis

Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications.
Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.

Spis treści

Preface. Plasma Etching: Introduction to Plasma Etching; T.D. Mantei. Plasma Chemistry, Basic Processes and PECVD; D.L. Flamm. The Role of Ions in Reactive Ion Etching with Low Density Plasmas; J.W. Coburn. SiO2 Etching in High-Density Plasmas: Differences with Low-Density Plasmas; G.S. Oehrlein. Plasma Deposition: Introduction to Plasma Enhanced Chemical Vapor Deposition; T.S. Cale, et al. Topography Evolution During Semiconductor Processing; T.S. Cale, et al. Deposition of Amorphous Silicon; J. Perrin. Plasma Sources: High Density Sources for Plasma Etching; T.D. Mantei. Resonant Plasma Excitation by Electron Cyclotron Waves - Fundamentals and Applications; H. Oechsner. The Transition from Capacitive to Inductive to Wave Sustained Discharges; R.W. Boswell, et al. Physics of Surface-Wave Discharges; J. Margot, M. Moisan. Plasma-Surface Interactions: Surface Science Aspects of Etching and Wall Reactions in High Density Plasmas; J.W. Coburn. Plasma-Surface Interactions; R. d'Agostino. Cl2 Plasma-Si Surface Interactions in Plasma Etching; V.M. Donnelly, et al. Numerical Modeling: Particle in Cell Monte Carlo Collision Codes (PIC-MCC), Methods and Applications to Plasma Processing; J.-P. Boeuf, A. Merad. Plasma Diagnostics: Optical Diagnostics of Processing Plasmas; P.F. Williams. Optical Diagnostics of Plasmas: A Tool for Process Control; N. Sadeghi, et al. Infrared Absorption Spectroscopy as a Diagnostic for Processing Plasmas; G.M.W. Kroesen. Ellipsometric Analysis of Plasma Deposited and Plasma Etched Materials; J.A. Woollam. Mass Spectrometry of Reactive Plasmas; J. Perrin. Less Conventional Processing Applications of Plasmas: Deposition of Silicon Dioxide Films Using the Helicon Diffusion Reactor for Integrated Optics Applications; R.W. Boswell, et al. Remote Plasma Processing; G.S. Oehrlein. Magnetized Surface-Wave Discharges for Submicrometer Pattern Transfer; J. Margot, et al. Dusty Plasmas: Fundamental Aspects and Industrial Applications; G.M.W. Kroesen. Industrial Application of Plasmas for Processing: Low Energy Plasma Beams for Semiconductor Technology; H. Oechsner. Process Control Concepts; S. Watts Butler. Issues and Solutions for Applying process Control to Semiconductor Manufacturing; S. Watts Butler. Index.