Plasma Etching: Fundamentals and Applications

ISBN-13: 9780198562870 / Angielski / Twarda / 1998 / 362 str.

Minoru Sugawara

Opis

This book focuses on the remarkable recent advances in understanding low pressure radio frequency glow discharges. It explains the basic analytical theory, plasma physics, and plasma diagnostics, before proceeding to the details of the etching process.

O autorze

Professor Minoru Sugawara, Hachinohe Institute of Technology, Hachinohe-city, Aomori 031, Japan. Fax: (0) 178 25 1430