Nsti Nanotech: Technical Proceedings, Volume 2

ISBN-13: 9780972842280 / Angielski / Miękka / 2007 / 519 str.

Nano Science & Technology Institute

Opis

First published in 2007. Routledge is an imprint of Taylor & Francis, an informa company.

Spis treści

Chapter 1: ,Advanced Semiconductors,An Electrothermal Solution of the Heat Equation for MMICs Based on the 2D Fourier Series,A. Giorgio and A.G. Perri,Politecnico di Bari, IT,,Spectral Analysis of Channel Noise in Nanoscale MOSFETS,G. Casinovi,Georgia Institute of Technology, US,,Gate Length Scaling Effects in ESD Protection Ultrathin Body SOI Devices,JW Lee, Y. Li and S.M. Sze,Natl Nano Device Labs & Natl Chiao Tung Univ, TW,,A Unified Mobility Model for Excimer Laser Annealed Complementary Thin Film Transistors Simulation,HY Lin, Y. Li, JW Lee, CM Chiu and S.M. Sze,Natl Nano Device Labs & Natl Chiao Tung Univ, TW,,Chapter 2: ,Nano Scale Device Modeling,Impact of Quantum Mechanical Tunnelling on Offleakage Current in Doublegate MOSFET using a Quantum Driftdiffusion Model,MA Jaud, S. Barraud and G. Le Carval,CEALETI, FR,,Methodology for Prediction of Ultra Shallow Junction Resistivities Considering Uncertainties with a Genetic Algorithm Optimization,C. Renard, P. Scheiblin, F. de Crécy, A. Ferron, E. Guichard, P. Holliger and C. Laviron,CEALETI, FR,,Fullband Particlebased Simulation of GermaniumOnInsulator FETs,S. Beysserie, J. Branlard, S. Aboud, S.M. Goodnick, T. Thornton and M. Saraniti,Illinois Institute of Technology, US,,A TechnologyIndependent Model for Nanoscale Logic Devices,M.P. Frank,University of Florida, US,,Hierarchical Simulation Approaches for the Design of UltraFast Amplifier Circuits,J. Desai, S. Aboud, P. Chiney, P. Osuch, J. Branlard, S. Goodnick and M. Saraniti,IIT/Rush University, US,,Principles of Metallic Field Effect Transistor (METFET),S.V. Rotkin and K. Hess,University of Illinois at UrbanaChampaign, Beckman Institute for Advanced Science and Technology, US,,Ab Initio Simulation on Mechanical and Electronic Properties of Nanostructures under Deformation,Y. Umeno and T. Kitamura,Kyoto University, JP,

O autorze

NanoScience & Technology Institute