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Mos Interface Physics, Process and Characterization

Name: Mos Interface Physics, Process and Characterization
Brand: CRC Press
Price: 441.69 PLN
Availability: InStock

ISBN-13: 9781032106274 / Angielski / Twarda / 2021 / 162 str.

Shengkai Wang; Xiaolei Wang

Mos Interface Physics, Process and Characterization

ISBN-13: 9781032106274 / Angielski / Twarda / 2021 / 162 str.

Shengkai Wang; Xiaolei Wang

cena 441,69 zł
(netto: 420,66 VAT: 5%)

Najniższa cena z 30 dni: 418,05 zł

Termin realizacji zamówienia:
ok. 16-18 dni roboczych.

Darmowa dostawa!

inne wydania

The electronic device based on Metal Oxide Semiconductor (MOS) structure is the most important component of a large-scale integrated circuit and the key to achieving high performance devices. This book contains experimental examples focusing on MOS and will be a reference for academics and postgraduates in the field of microelectronics.

Kategorie:

Technologie

Kategorie BISAC:

Technology & Engineering > Electronics - Microelectronics
Technology & Engineering > Electronics - Semiconductors
Technology & Engineering > Electronics - Transistors

Wydawca:

CRC Press

Język:

Angielski

ISBN-13:

9781032106274

Rok wydania:

2021

Ilość stron:

162

Waga:

0.40 kg