Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology

ISBN-13: 9780824799519 / Angielski / Twarda / 1998 / 336 str.

Saburo Nonogaki; Takumi Ueno;Nonogaki

Opis

"Explores the science and technology of lithographic processes and resist materials and summarizes the most recent innovations in semiconductor manufacturing. Considers future trends in lithography and resist material technology. Reviews the interaction of light, electron beams, and X-rays with resist materials."

Spis treści

Exposure systems in photolithography; optical pattern transfer; chemistry of photoresist materials; practical processes in microlithography; X-ray lithography; electron-beam lithography; variations in microlithographic process.

O autorze

Saburo Nonogaki, Ueno Takumi, Toshio Ito