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Mechanical Properties of Silicon Based Compounds: Silicides

ISBN-13: 9783030225971 / Angielski / Twarda / 2019 / 274 str.

Joshua Pelleg
Mechanical Properties of Silicon Based Compounds: Silicides Joshua Pelleg 9783030225971 Springer - książkaWidoczna okładka, to zdjęcie poglądowe, a rzeczywista szata graficzna może różnić się od prezentowanej.

Mechanical Properties of Silicon Based Compounds: Silicides

ISBN-13: 9783030225971 / Angielski / Twarda / 2019 / 274 str.

Joshua Pelleg
cena 401,58
(netto: 382,46 VAT:  5%)

Najniższa cena z 30 dni: 385,52
Termin realizacji zamówienia:
ok. 22 dni roboczych
Dostawa w 2026 r.

Darmowa dostawa!
inne wydania
Kategorie:
Technologie
Kategorie BISAC:
Technology & Engineering > Materials Science - General
Wydawca:
Springer
Seria wydawnicza:
Engineering Materials
Język:
Angielski
ISBN-13:
9783030225971
Rok wydania:
2019
Dostępne języki:
Numer serii:
000089500
Ilość stron:
274
Waga:
0.58 kg
Wymiary:
23.39 x 15.6 x 1.75
Oprawa:
Twarda
Dodatkowe informacje:
Wydanie ilustrowane

1 What are the silicides

    References

 

2 Structure

   References

 

3 Fabrication

   3.1 Bulk Silicides

        3.1.1 Arc Casting (Melting)

        3.1.2 Directional Solidification

           3.1.2.1 Bridgman

           3.1.2.2 Czochralski

   3.2 Thin Fims

        3.2.1 Sputtering

        3.2.2 Electron Beam Deposition

   References

 

4 Testing Deformation

   4.1 Introduction

   4.2 Tension

      4.2.1 CoSi2

      4.2.2 NiSi2

      4.2.3 MoSi2

      4.2.4 WSi2

      4.2.5 FeSi2

      4.2.6 TiSi2

   4.3 Compression

      4.3.1 Introduction

      4.3.2 CoSi2

         4.3.3 MoSi2

      4.3.4 WSi2

      4.3.5 TiSi2

   4.4 Indentation-Hardness

      4.4.1 Introduction

      4.4.2 NiSi2 film

      4.4.3 MoSi2 Single Crystal

          4.4.3.1 MoSi2 Film

      4.4.4 WSi2 Film (Coating)

      4.4.5 a-FeSi2

      4.4.6 TiSi2

   References

 

5 Dislocations in silicides

 5.1 Introduction

 5.2 Dislocations in CoSi2

 5.2.1 Single Crystal

        5.2.2 Film-Single Crystal Epitaxy

5.3 Dislocations in NiSi2

   5.3.1 Epitaxial Thin Film

     5.4 Dislocations in MoSi2

   5.4.1 Single Crystals

5.5 Dislocations in WSi2

      5.5.1 Single Crystals

5.6 Dislocations in WSi2

      5.6.1 Single Crystals

  References

 

 6 Time Dependent Deformation - Creep in Silicides

     6.1 Fundamentals od Creep

     6.2 Creep in CoSi2

     6.3 Creep I MoSi2

     6.4 Creep in MoSi2-WSi2

6.5 Creep in TiSi2

References

 

7 Fatigue in Silicides

     7.1 Basics

     7.2 Silicide Composites

              7.2.1 Fatigue in MoSi2 Composites

              7.2.1.1 Nb Reinforcement

       7.2.1.2 Reinforcement-Nb Spheres

       7.2.1.3 Reinforcement-Nb Fibers

References

 

8. Fracture in Silicides

 8.1 Fracture in CoSi2 Single Crystals

      8.2 Fracture in polycrystalline CoSi2

      8.3 Fracture in MoSi2 Single Crystals

      8.4 Fracture in Polycrystalline MoSi2

      8.5 Fracture in WSi2 Single Crystals

      8.6 Fracture in Polycrystalline TiSi2

References

 

9. Deformation in Nano Silicides 

9.1 Introduction

     9.2 Tension Test

     9.3 Hardness Tests

9.3.1 Hardness in Nano MoSi2

9.3.2 Hardness in Nano FeSi2

9.3.3 Hardness in Nano TiSi2

References

 

10. The Effect of B

10.1 Introduction

     10.2 B Effect in CoSi2

     10.3 B Effect in MoSi2

10.4 B Effect in TiSi2

References

 

11. Silicide Composites

11.1 Introduction

     11.2 MoSi2 Based Composites

       11.2.1 MoSi2/SiC

              11.2.2 MoSi2/Si3N4

11.3 MoSi2/Silicide Composite

               11.3.1 MoSi2/TaSi2

               11.3.2 MoSi2/WSi2

               11.3.2 MoSi2/Mo5Si3

11.4 WSi2 Based Composites

11.4.1 WSi2/SiC

              11.5. WSi2/Silicides

11.5.1 WSi2/TaSi2

11.5 TiSi2 Based Composites

11.5.1 TiSi2/SiC

Referances

 

12 Alloying in Silicides

12.1 Introduction

     12.2 Alloying of NiSi2

     12.3 Alloying of MoSi2

     12.3.1 Metallic Element Addition

            12.3.2 Solid Solution Hardening (Softening

References

 

13. Grain Size Effect on Mechanical Properties

13.1 Introduction

13.2 MoSi2 Static Properties

13.3 MoSi2 Creep (Time Dependent) Properties

13.4 Ti5Si3 Static Properties

13.5 Ti5Si3 Creep (Time Dependent) Properties

References

 

14. Environmental Effect on Mechanical Properties

14.1 Introduction

14.2 CoSi2-Oxidation

14.3 NiSi2-Oxidation

     14.4 MoSi2-Oxidation

14.5 WSi2-Oxidation

14.6 TiSi2-Oxidation

References

Joshua Pelleg received his B.Sc. in Chemical Engineering at the Technion—Institute of Technology, Haifa, Israel; a M.Sc. in Metallurgy at the Illinois Institute of Technology, Chicago, IL and a Ph.D. in Metallurgy at the University of Wisconsin, Madison, WI. He has been in the BenGurion University of the Negev (BGU) Materials Engineering Department in BeerSheva, Israel since 1970, and was among the founders of the department, and served as its second chairman. Professor Pelleg was the recipient of the Samuel Ayrton Chair in Metallurgy. He specializes in the mechanical properties of materials and the diffusion and defects in solids. He has chaired several university committees and served four terms as the Chairman of Advanced Studies at BenGurion University of the Negev. Prior to his work at BGU, Pelleg acted as Assistant Professor and then Associate Professor in the Department of Materials and Metallurgy at the University of Kansas, Lawrence, KS. Professor Pelleg was also a Visiting Professor: in the Department of Metallurgy at Iowa State University; at the Institute for Atomic Research, US Atomic Energy Commission, Ames, IA; at McGill University, Montreal, QC; at the Tokyo Institute of Technology, Applied Electronics Department, Yokohama, Japan; and in Curtin University, Department of Physics, Perth, Australia. His nonacademic research and industrial experience includes: Chief Metallurgist in Urdan Metallurgical Works Ltd., Netanyah, Israel; Research Engineer in International Harvester Manufacturing Research, Chicago, IL; Associate Research Officer for the National Research Council of Canada, Structures and Materials, National Aeronautical Establishment, Ottawa, ON; Physics Senior Research Scientist, Nuclear Research Center, BeerSheva, Israel; Materials Science Division, Argonne National Labs, Argonne, IL; Atomic Energy ofCanada, Chalk River, ON; Visiting Scientist, CSIR, National Accelerator Centre, Van de Graaf Group Faure, South Africa; Bell Laboratories, Murray Hill, NJ; and GTE Laboratories, Waltham, MA. His current research interests are diffusion in solids, thin film deposition and properties (mostly by sputtering) and the characterization of thin films, among them various silicides.

This book focuses on the mechanical properties of silicides for very large scale integration (VLSI) applications. It presents the fabrication process for bulk silicides and thin films, and list complete testing deformation for a variety of silicon based compounds. The author also presents dislocation in silicides, fatigue and fracture aspects. A special chapter is given on deformation in silicides in the nano scale. Composites and alloys are also considered.



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