Lattice Engineering: Technology and Applications

ISBN-13: 9789814316293 / Angielski / Twarda / 2012 / 412 str.

Shumin Wang

Opis

This book contains comprehensive reviews of different technologies to harness lattice mismatch in semiconductor heterostructures and their applications in electronic and optoelectronic devices. While the book is a bit focused on metamorphic epitaxial growth, it also includes other methods like compliant substrate, selective area growth, wafer bonding, heterostructure nanowires, and more. Basic knowledge on dislocations in semiconductors and innovative methods to eliminate threading dislocations are provided, and successful device applications are reviewed. It covers a variety of important semiconductor materials like SiGe, III-V including GaN and nano-wires; epitaxial methods like molecular beam epitaxy and metal organic vapor phase epitaxy; and devices like transistors and lasers etc.

Spis treści

Dislocation Reduction by Interfacial Misfit Method. Compliant Substrates. Selective Area Growth. Low Temperature Direct Wafer Bonding. Heterostructures and Strain Relaxation In Semiconductor Nanowires. Epitaxial Growth of Nitrides. Metamorphic HEMT Technology. Metamorphic Hbts, Metamorphic Quantum Dot Lasers. Metamorphic Quantum Well Lasers. Nitride Based LEDS And Laser Diodes.