High Resolution X-Ray Diffractometry and Topography

ISBN-13: 9780850667585 / Angielski / Twarda / 1998 / 264 str.

D. Keith Bowen; Keith D. Bowen; Brian K. Tanner

Opis

The study and application of electronic materials has created an increasing demand for sophisticated and reliable techniques for examining and characterizing these materials. This comprehensive book looks at the area of x-ray diffraction and the modern techniques available for deployment in research, development and production. It provides the theoretical and practical background for applying these techniques in scientific and industrial materials characterization.

Spis treści

Introduction- diffraction studies of crystal perfection; high resolution X- ray diffraction techniques; analysis of expitaxial layers; X-ray scattering theory; simulation of X-ray diffraction rocking curves; analysis of thin films and multiple layers; triple axis X-ray diffractometry; single crystal X-ray topography; double crystal X-ray topography; synchrotron radiation topography.

O autorze

Bowen, D.K.; Tanner, Brian K.