High Resolution X-Ray Diffractometry and Topography

ISBN-13: 9780367400637 / Angielski / Miękka / 2019 / 264 str.

D. K. Bowen; Brian K. Tanner

Opis

The rapid growth in the applications of electronic materials has created an increasing demand for reliable techniques for examining and characterizing these materials. This book explores the area of x-ray diffraction and the techniques available for deployment in research, development, and production. It maps the theoretical and practical background necessary to study single crystal materials using high resolution x-ray diffraction and topography. It combines mathematical formalism with graphical explanations and hands-on advice for interpreting data, thus providing the theoretical and practical background for applying these techniques in scientific and industrial materials characterization.

Spis treści

Introduction- diffraction studies of crystal perfection; high resolution X- ray diffraction techniques; analysis of expitaxial layers; X-ray scattering theory; simulation of X-ray diffraction rocking curves; analysis of thin films and multiple layers; triple axis X-ray diffractometry; single crystal X-ray topography; double crystal X-ray topography; synchrotron radiation topography.

O autorze

Bowen, D.K.; Tanner, Brian K.