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Chemistry and Lithography: The Chemical History of Lithography

ISBN-13: 9781510631557

Uzodinma Okoroanyanwu
Chemistry and Lithography: The Chemical History of Lithography Uzodinma Okoroanyanwu   9781510631557 SPIE Press - książkaWidoczna okładka, to zdjęcie poglądowe, a rzeczywista szata graficzna może różnić się od prezentowanej.

Chemistry and Lithography: The Chemical History of Lithography

ISBN-13: 9781510631557

Uzodinma Okoroanyanwu
cena 282,33 zł
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This book is the first in a series of three volumes that make up the second edition of Chemistry and Lithography (2010). Although it is continued in Vol. 2, Chemistry in Lithography, and Vol. 3, The Practice of Lithography, each volume stands on its own. Volume 1 of the second edition weaves together threads of a narrative on the history of optical and molecular physics, optical technology, chemistry, and lithography, with the aim to give readers new insight into an aspect of the relationships between these fields that is often not fully appreciated: how the marriage of chemistry and optics led to the development and evolution of lithography. The book shows how major developments in chemistry, physics, and the technology of light have influenced the invention and development of lithography well beyond what its inventor envisioned. It also shows how developments in lithography have not only influenced the development of optics and chemistry, but also have played a critical role in the large-scale manufacture of integrated circuits that run the computers and machineries on which our modern electronic and information age depend. Finally, this book provides an analysis of the emerging trends in lithographic patterning, along with the current and potential applications of the resulting patterned structures and surfaces.

Kategorie:
Inne
Kategorie BISAC:
Technology & Engineering > Optics
Wydawca:
SPIE Press
ISBN-13:
9781510631557

  • 1 Introduction to Lithography
  • 2 Invention of Lithography and Photolithography
  • 2.1 Introduction
  • 2.2 Invention of Lithography
  • 2.3 Invention of Photolithography
  • 2.4 Pioneers of Photolithography
  • 2.4.1 Joseph Nicéphore Niépce: the inventor of photography and photolithography
  • 2.4.2 Louis Jacques Mandé Daguerre
  • 2.4.3 William Henry Fox Talbot
  • 3 Physical Origins of Lithography
  • 3.1 Introduction
  • 3.2 Key Developments in Optical Physics that Enabled the Invention and Development of Lithography
  • 3.2.1 Tactile and emission theories of light
  • 3.2.2 Early studies in optics and catoptrics
  • 3.2.3 The nature of light
  • 3.2.4 Light and color
  • 3.2.5 Light as a wave or particle
  • 3.2.6 Electromagnetic theory
  • 3.2.7 Electromagnetic spectrum
  • 3.3 Key Developments in Optical Instruments and Glassmaking Technologies that Enabled the Development of Lithography
  • 3.4 Key Developments in Atomic and Molecular Physics that Enabled the Invention and Development of Lithography
  • 3.4.1 The nature of matter
  • 3.4.2 Molecular theory of matter
  • 3.4.3 Electrons
  • 3.4.4 X-rays
  • 3.4.5 Radioactivity
  • 3.4.6 The beginnings of quantum theory
  • 3.4.7 Blackbody radiation
  • 3.4.8 Planck's quantum hypothesis for the blackbody radiation law
  • 3.4.9 Einstein's quantum hypothesis for the photoelectric effect
  • 3.4.10 Bright and dark line spectra
  • 3.4.11 Atomic structure
  • 3.4.12 Nuclear model of the atom
  • 3.4.13 Bohr's model of the hydrogen atom
  • 3.4.14 Implications of Bohr's theory
  • 3.4.15 Quantum theory of light
  • 4 Chemical Origins of Lithography
  • 4.1 Introduction
  • 4.2 Key Developments in Chemistry that Enabled the Invention and Development of Lithography
  • 4.2.1 The four-element theory
  • 4.2.2 Chemistry as a distinct discipline
  • 4.2.3 Alchemy
  • 4.2.4 Early theories on the nature of fire and combustion
  • 4.2.5 Phlogiston theory
  • 4.2.6 Beginnings of modern chemistry
  • 4.2.7 Discovery of simple gases in common air
  • 4.2.8 Absorption of light
  • 4.2.9 Chemical effects of light
  • 4.2.10 Foundation of modern chemistry
  • 4.2.11 Post-Lavoisian evolution of chemistry
  • 4.3 Laws and Theories of Chemical Reactions
  • 4.3.1 Atomic theory
  • 4.3.2 The law of constant or definite proportions
  • 4.3.3 The law of multiple proportions
  • 4.3.4 The law of reciprocal proportions or the law of equivalents
  • 4.3.5 Electrochemical theory
  • 4.3.6 Laws of electrolysis
  • 4.3.7 Law of combining volumes
  • 4.3.8 Avogadro's hypothesis
  • 4.3.9 Law of mass action
  • 4.3.10 Thermochemical laws
  • 4.3.11 The phase rule
  • 4.3.12 Theory of solutions
  • 4.3.13 Theory of electrolytic dissociation
  • 4.3.14 Le Chatelier's law of reactions
  • 4.3.15 The periodic table and the periodic law
  • 4.3.16 Electronic theory of valency
  • 4.3.17 Theory of the periodic table
  • 4.3.18 Theory of directed valencies
  • 4.3.19 Theory of substitution
  • 4.4 Rational Synthesis of Chemical Substances
  • 4.5 The Structure of Chemical Compounds and Phenomena Deriving from Them
  • 4.5.1 The structural formula of benzene
  • 4.5.2 Optical activity
  • 5 Evolution of Lithography
  • 5.1 Introduction
  • 5.2 Offset Lithography
  • 5.3 The Printed Circuit Board and the Development of the Electronics Industry
  • 5.4 The Transistor and Microelectronics Revolution
  • 5.4.1 The invention of the transistor
  • 5.4.2 Limits of discrete transistors
  • 5.4.3 The integrated circuit
  • 5.4.4 Other notable developments in transistor technology
  • 5.4.5 Overall device technology trends
  • 5.5 Semiconductor Lithography
  • 5.6 Advanced Lithographic Patterning Techniques and Imaging Mechanisms
  • 5.6.1 Optical lithography
  • 5.6.2 X-ray lithography
  • 5.6.3 Electron-beam lithography
  • 5.6.4 Ion-beam lithography
  • 5.6.5 Extreme-ultraviolet lithography
  • 5.6.6 Soft lithography
  • 5.6.7 Nano-imprint lithography
  • 5.6.8 Proximal probe lithography
  • 5.6.9 Atom lithography
  • 5.6.10 Self-assembly lithography
  • 5.6.11 Stereolithography
  • 5.7 Outlook on the Evolution of Lithography
  • Index



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