Contamination-Free Manufacturing for Semiconductors and Other Precision Products

ISBN-13: 9780824703806 / Angielski / Twarda / 2001 / 460 str.

Robert P. Donovan;Donovan; R. P. Donovan

Opis

Recognizing the need for improved control measures in the manufacturing process of highly sensitized semiconductor technology, this practical reference provides in-depth and advanced treatment on the origins, procedures, and disposal of a variety of contaminants. It uses contemporary examples based on the latest hardware and processing apparatus to illustrate previously unavailable results and insights along with experimental and theoretical developments.
Ensures the proper methods necessary to meet the standards established in the 1997 National Technology Roadmap for Semiconductors (NTRS)
Summarizing up-to-date control practices in the industry, Contamination-Free Manufacturing for Semiconductors and Other Precision Products:

Details the physics and chemistry behind the mechanisms leading to contamination-induced failures

Considers particles and molecular contaminants, including the entire spectrum of mass-based contaminants

Outlines primary contamination problems and target control levels

Reveals and offers solutions to inadequate areas of measurement capability and control technology

Clarifies significant problems and decisions facing the industry by analyzing NTRS standards and contamination mechanisms
Containing over 700 literature references, drawings, photographs, equations, and tables, Contamination-Free Manufacturing for Semiconductors and Other Precision Products is an essential reference for electrical and electronics, instrumentation, process, manufacturing, development, contamination control and quality engineers; physicists; and upper-level undergraduate and graduate students in these disciplines.

Spis treści

National Technology Roadmap for Semiconductors - basis and alignment; off-wafer measurement of contaminants; on-wafer measurement of molecular contaminants; transport and deposition of aerosol particles; particulate deposition in liquid systems; deposition of molecular contaminants in gaseous environments; contamination removal from surfaces; deposition of metallic contaminants from liquids and their removal; sources of contamination and their control.

O autorze

Robert P. Donovan