Thin Film Diamond

ISBN-13: 9780412496301 / Angielski / Twarda / 1993 / 157 str.

A. Lettington; J. W. Steed; J. W. Steeds

Opis

This text presents papers given at a discussion meeting of The Royal Society, held in July 1992, concerning thin film diamond. Traditionally, commercial diamond synthesis was almost entirely by the high-pressure, high-temperature technique, but in recent years, low-pressure diamond synthesis has attracted world-wide interest due to the possible use of diamond films in commercial applications. These papers review these low-pressure diamond synthesis techniques.

Spis treści

Chemical vapour deposition of diamond - J C Angus; Thin film diamond growth mechanisms - J E Butler; Microwave plasma chemical vapour deposition and related techniques for low pressure diamond synthesis - P K Bachmann; Local epitaxial growth of diamond on nickel from the vapour phase - Y Sato; The optical and electronic properties of semiconducting diamond - A T Collins; The thermal conductivity of CVD diamond films - T R Anthony; Electron irradiation and heat treatment of polycrystalline CVD diamond - C D Clark; Strength, fracture and erosion properties of CVD diamond - J E Field. Deposition of diamond-like carbon - J Robertson; Applications of diamond-like carbon thin films - A H Lettington; Diamond as a wear-resistant coating - B Lux; Thermal and optical applications of thin film diamond - M Seal.