The continuous downscaling in microelectronic circuits faces various challenges that affect fabrication, material properties and characterization techniques. The present work illustrates this for the field of ferroelectrics. Two routes for the fabrication of ferroelectric nanostructures are presented. In a subtractive route, a ferroelectric thin film is the starting point from which ferroelectric nanostructures are cut out. In an additive route, the ferroelectric matter is deposited onto a surface with predefined affinity seed-spots. In this non-destructive method, ferroelectric crystals are...