Magnetrons, reactive gases and sputtering » książka
Magnetrons, reactive gases and sputtering
ISBN-13: 9781304347817 / Angielski / Twarda / 2013 / 476 str.
This handbook covers the fundamental aspects of reactive magnetron sputter deposition. This so-called physical vapor deposition technique is used to grow compound thin films. The books starts with an explanation of the four title words. Using a simple model several aspects of the deposition technique are introduced. In the following chapters the book introduces a more complete mode to address some specific features of reactive sputter deposition. Finally, some important points related to thin film growth are introduced and illustrated.
This handbook covers the fundamental aspects of reactive magnetron sputter deposition. This so-called physical vapor deposition technique is used to grow compound thin films. The books starts with an explanation of the four title words. Using a simple model several aspects of the deposition technique are introduced. In the following chapters the book introduces a more complete mode to address some specific features of reactive sputter deposition. Finally, some important points related to thin film growth are introduced and illustrated.
Czytaj nas na:
KrainaKsiazek.PL - Księgarnia Internetowa
