Handbook of Industrial Diamonds and Diamond Films

ISBN-13: 9780367400842 / Angielski / Miękka / 2019 / 1232 str.

Mark A. Prelas; Galina Popovici; Louis K. Bigelow

Opis

Examines both mined and synthetic diamonds and diamond films. The text offers coverage on the use of diamond as an engineering material, integrating original research on the science, technology and applications of diamond. It discusses the use of chemical vapour deposition grown diamonds in electronics, cutting tools, wear resistant coatings, thermal management, optics and acoustics, as well as in new products.

Recenzje

". . .This very in-depth book could be used by those involved with the production, characterization or application of synthetic diamond. "
---IEEE Electrical Insulation Magazine

Spis treści

"Properties Band Structure, Alan T. Collins Diamond Morphology, Robert E. Clausing Mechanical Properties of Diamond, Diamond Films, Diamond-Like Carbon, and Like-Diamond Materials, Peter J. Gielisse Surface Properties of Diamond, Mark P. D'Evelyn Thermal Properties Heat Capacity, Conductivity, and the Thermal Coefficient of Expansion, V. I. Nepsha Thermal Measurement Techniques, John E. Graebner Optical Properties, Alexander M. Zaitsev Electrical and Electronic Properties, Alexander G. Gontar Characterization Characterization Methods, Karen McNamara Rutledge and Karen K. Gleason Mined Diamond Natural Diamond, Henry O. A. Meyer and Michael Seal Theory Theory of Diamond Chemical Vapor Deposition, David G. Goodwin and James E. Butler Modeling and Diagnostics of Plasma Reactors Introduction, A. Gicquel Basic Processes in Plasmas Under Conditions Typical for Diamond Deposition, A. Gicquel Basic Processes: Plasma/Surface Interactions, A. Gicquel The Boltzmann Equation, Matt Gordon Flow Modeling for a Plasma Assisted Diamond Deposition Reactor, K. Hassouni, C. D. Scott, and S. Farhat Electromagnetic Field Modeling of Diamond CVD Reactors, Timothy A. Grotjohn Modeling of the Diffusional Transport of an H2 Plasma Obtained Under Diamond Deposition Discharge Conditions, K. Hassouni, C. D. Scott, and S. Farhat Spatially Resolved Spectroscopic Analysis of the Plasma, A. Gicquel, M. Chenevier, and M. Lefebvre Methods of Chemical Vapor Deposition Growth Hot-Filament CVD Methods, Alberto Argoitia, Christopher S. Kovach, and John C. Angus Microwave Plasma Chemical Vapor Deposition of Diamonds, Peter K. Bachmann Diamond CVD Using Radio-Frequency Plasmas, Steven L. Girshick Synthesis of Diamond, Mark A. Cappelli Low Temperature CVD, Akimitsu Hatta and Akio Hiraki Structural Modification of Diamond Nucleation and Epitaxy, S. P. Bozeman, B. R. Stoner, and J. T. Glass Ion Implantation of Diamond and Diamond Films, R. Kalish and S. Prawer Processing, Victor G. Ralchenko and Sergei M. Pime

O autorze

Mark A. Prelas, Galina Popovici, Louis K. Bigelow